Well aligned ultrasharp nanotip arrays for high-efficiency field emission

Chi-Chang Wu, Keng-Liang Ou, Chung Huan Shieh

研究成果: 書貢獻/報告類型會議貢獻

摘要

We have fabricated a large area and well aligned ultrasharp nanotip arrays by using photolithography and reactive ion etching techniques. The apex of the tip can be as sharp as about 3 nm in radius. The mechanism of nanotip formation is that the remained photoresist on top of the tip is gradually reduced with increasing the etching time, and hence sidewall of the tip is pared to form a pointier nanotip. At the end, the photoresist is fully etched away and a pyramid-like shape is formed at the tip-end due to the etch probability of incident ion on the sidewall. The field emission property of the ultrasharp nanotip is measured, and the turn-on field is about 20 MV-cm.
原文英語
主出版物標題Proceedings - International NanoElectronics Conference, INEC
DOIs
出版狀態已發佈 - 2011
事件4th IEEE International Nanoelectronics Conference, INEC 2011 - Tao-Yuan, 臺灣
持續時間: 六月 21 2011六月 24 2011

其他

其他4th IEEE International Nanoelectronics Conference, INEC 2011
國家臺灣
城市Tao-Yuan
期間6/21/116/24/11

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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