Treating chemical mechanical polishing (CMP) wastewater by electro-coagulation-flotation process with surfactant

C. Y. Hu, S. L. Lo, C. M. Li, W. H. Kuan

研究成果: 雜誌貢獻文章

41 引文 (Scopus)

摘要

The effect of surfactants on the treatment of chemical mechanical polishing (CMP) wastewater by electro-coagulation-flotation (ECF) process was studied. Two surfactants, cetyltrimethylammonium bromide (CTAB) and sodium dodecylsulfate (SDS) were employed in this study to compare the effect of cationic (CTAB) and anodic (SDS) surfactants on ECF. The cationic surfactant can enhance the removal of the turbidity, but anodic surfactant cannot. It can be explained by the hetero-coagulation theory. Moreover, the addition of CTAB in CMP wastewater can reduce the sludge volume and the flotation/sedimentation time in ECF process. The residual turbidity and dissolved silicon dropped with the increase of charge loading. No CTAB pollution problem exists after the ECF process.

原文英語
頁(從 - 到)15-20
頁數6
期刊Journal of Hazardous Materials
120
發行號1-3
DOIs
出版狀態已發佈 - 四月 11 2005
對外發佈Yes

指紋

Chemical mechanical polishing
Waste Water
Coagulation
Flotation
Surface-Active Agents
coagulation
surfactant
Wastewater
Surface active agents
bromide
wastewater
Turbidity
turbidity
Sodium
sodium
Cationic surfactants
Silicon
Sewage
Sedimentation
silicon

ASJC Scopus subject areas

  • Chemical Health and Safety
  • Process Chemistry and Technology
  • Safety, Risk, Reliability and Quality
  • Environmental Engineering

引用此文

Treating chemical mechanical polishing (CMP) wastewater by electro-coagulation-flotation process with surfactant. / Hu, C. Y.; Lo, S. L.; Li, C. M.; Kuan, W. H.

於: Journal of Hazardous Materials, 卷 120, 編號 1-3, 11.04.2005, p. 15-20.

研究成果: 雜誌貢獻文章

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