The effect of deposition parameters and post treatment on the electrical properties of Mo thin films

Cherng Yuh Su, Kuang Hsiang Liao, Cheng Tang Pan, Pei Wen Peng

研究成果: 雜誌貢獻文章同行評審

14 引文 斯高帕斯(Scopus)

摘要

In this study, we deposited low-resistivity molybdenum (Mo) thin films on soda-lime glass substrates with good adhesion. We adjusted various deposition parameters such as the sputtering power (52-102 W), working distance (5.5-9 cm) and annealing temperature (26-400 °C) to investigate their impact on the sheet resistance. By using a DC magnetron sputtering system, we obtained Mo thin films having the lowest sheet resistance of 0.190 Ω/□ with a sputtering power of 82 W, working distance of 6.5 cm, and annealing temperature of 400 °C; in addition, these films had good adhesivity. These Mo thin films were suitable for use as the Mo back contact in Cu(In,Ga)Se 2-based solar cells.
原文英語
頁(從 - 到)5936-5939
頁數4
期刊Thin Solid Films
520
發行號18
DOIs
出版狀態已發佈 - 七月 1 2012

ASJC Scopus subject areas

  • 電子、光磁材料
  • 材料化學
  • 金屬和合金
  • 表面、塗料和薄膜
  • 表面和介面

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