Protective effects of plasma alpha-tocopherols on the risk of inorganic arsenic-related urothelial carcinoma

Chi Jung Chung, Yeong Shiau Pu, Ying Ting Chen, Chien Tien Su, Chia Chang Wu, Horng Sheng Shiue, Chao Yuan Huang, Yu Mei Hsueh

研究成果: 雜誌貢獻文章

13 引文 斯高帕斯(Scopus)

摘要

Arsenic plays an important role in producing oxidative stress in cultured cells. To investigate the interaction between high oxidative stress and low arsenic methylation capacity on arsenic carcinogenesis, a case-control study was conducted to evaluate the relationship among the indices of oxidative stress, such as urinary 8-hydroxydeoxyquanine (8-OHdG), as well as plasma micronutrients and urinary arsenic profiles on urothelial carcinoma (UC) risk. Urinary 8-OHdG was measured using high-sensitivity enzyme-linked immunosorbent assay kits. The urinary arsenic species were analyzed using high-performance liquid chromatography and hydride generator-atomic absorption spectrometry. Plasma micronutrient levels were analyzed using reversed-phase high-performance liquid chromatography. The present study showed a significant protective effect of plasma alpha-tocopherol on UC risk. Plasma alpha-tocopherol levels were significantly inversely related to urinary total arsenic concentrations and inorganic arsenic percentage (InAs%), and significantly positively related to dimethylarsinic acid percentage (DMA%). There were no correlations between plasma micronutrients and urinary 8-OHdG. Study participants with lower alpha-tocopherol and higher urinary total arsenic, higher InAs%, higher MMA%, and lower DMA% had a higher UC risk than those with higher alpha-tocopherol and lower urinary total arsenic, lower InAs%, lower MMA%, and higher DMA%. These results suggest that plasma alpha-tocopherol might modify the risk of inorganic arsenic-related UC.

原文英語
頁(從 - 到)1039-1045
頁數7
期刊Science of the Total Environment
409
發行號6
DOIs
出版狀態已發佈 - 二月 15 2011

ASJC Scopus subject areas

  • Environmental Chemistry
  • Pollution
  • Waste Management and Disposal
  • Environmental Engineering

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