Monitoring of arsenic exposure with speciated urinary inorganic arsenic metabolites for ion implanter maintenance engineers

Yaw Huei Hwang, Zhih Young Lee, Jung Der Wang, Yu Mei Hsueh, I. Chun Lu, Wan Lin Yao

研究成果: 雜誌貢獻文章

23 引文 斯高帕斯(Scopus)

摘要

For wafer fabrication in the semiconductor industry, maintenance engineers are potentially exposed to hazards during their work of disassembling machine components for cleanup. One special concern is the presence of arsenic or arsenic compounds in the working environment. This study analyzed speciated urinary inorganic arsenic metabolites of the maintenance engineers using high-performance liquid chromatography-hydride generation atomic absorption spectrometry to study the potential arsenic exposure during their maintenance work. In total, from six wafer fabrication facilities, 30 maintenance engineers were recruited as the exposed group and another 12 office-based engineers served as the control group. First morning-voided urine samples of each study subject were collected for 7 consecutive days. The levels of total urinary inorganic arsenic metabolites for the exposed group were 1.7±1.4, 1.4±1.1, 6.2±6.7, 20.2±14.1, and 29.5±17.2μg/L for As3+, As5+, monomethylarsonic acid, dimethylarsinic acid, and total inorganic arsenic, respectively. Both the concentration of monomethylarsonic acid and its percentage in total urinary inorganic arsenic metabolites showed significantly ascending trends for the control group, for the engineers without preventative maintenance work prior to their urine sampling, and for the engineers with such work prior to their urine sampling (P

原文英語
頁(從 - 到)207-216
頁數10
期刊Environmental Research
90
發行號3
DOIs
出版狀態已發佈 - 十一月 2002

ASJC Scopus subject areas

  • Environmental Science(all)

指紋 深入研究「Monitoring of arsenic exposure with speciated urinary inorganic arsenic metabolites for ion implanter maintenance engineers」主題。共同形成了獨特的指紋。

  • 引用此