Monitoring of arsenic exposure with speciated urinary inorganic arsenic metabolites for ion implanter maintenance engineers

Yaw Huei Hwang, Zhih Young Lee, Jung Der Wang, Yu Mei Hsueh, I. Chun Lu, Wan Lin Yao

研究成果: 雜誌貢獻文章

22 引文 (Scopus)

摘要

For wafer fabrication in the semiconductor industry, maintenance engineers are potentially exposed to hazards during their work of disassembling machine components for cleanup. One special concern is the presence of arsenic or arsenic compounds in the working environment. This study analyzed speciated urinary inorganic arsenic metabolites of the maintenance engineers using high-performance liquid chromatography-hydride generation atomic absorption spectrometry to study the potential arsenic exposure during their maintenance work. In total, from six wafer fabrication facilities, 30 maintenance engineers were recruited as the exposed group and another 12 office-based engineers served as the control group. First morning-voided urine samples of each study subject were collected for 7 consecutive days. The levels of total urinary inorganic arsenic metabolites for the exposed group were 1.7±1.4, 1.4±1.1, 6.2±6.7, 20.2±14.1, and 29.5±17.2μg/L for As3+, As5+, monomethylarsonic acid, dimethylarsinic acid, and total inorganic arsenic, respectively. Both the concentration of monomethylarsonic acid and its percentage in total urinary inorganic arsenic metabolites showed significantly ascending trends for the control group, for the engineers without preventative maintenance work prior to their urine sampling, and for the engineers with such work prior to their urine sampling (P

原文英語
頁(從 - 到)207-216
頁數10
期刊Environmental Research
90
發行號3
DOIs
出版狀態已發佈 - 十一月 2002

指紋

Arsenic
Metabolites
arsenic
metabolite
Maintenance
Ions
Engineers
ion
Monitoring
monitoring
urine
Urine
acid
Cacodylic Acid
Sampling
Arsenicals
Fabrication
Control Groups
Atomic absorption spectrometry
Semiconductors

ASJC Scopus subject areas

  • Environmental Science(all)

引用此文

Monitoring of arsenic exposure with speciated urinary inorganic arsenic metabolites for ion implanter maintenance engineers. / Hwang, Yaw Huei; Lee, Zhih Young; Wang, Jung Der; Hsueh, Yu Mei; Lu, I. Chun; Yao, Wan Lin.

於: Environmental Research, 卷 90, 編號 3, 11.2002, p. 207-216.

研究成果: 雜誌貢獻文章

Hwang, Yaw Huei ; Lee, Zhih Young ; Wang, Jung Der ; Hsueh, Yu Mei ; Lu, I. Chun ; Yao, Wan Lin. / Monitoring of arsenic exposure with speciated urinary inorganic arsenic metabolites for ion implanter maintenance engineers. 於: Environmental Research. 2002 ; 卷 90, 編號 3. 頁 207-216.
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AU - Yao, Wan Lin

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