Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)

Li Chun Wang, Yin Yi Han, Kai Chiang Yang, Miin Jang Chen, Hsin Chih Lin, Chung Kwei Lin, Yu Tong Hsu

研究成果: 雜誌貢獻文章

14 引文 斯高帕斯(Scopus)

摘要

Thermal ALD (T-ALD) and plasma-enhanced ALD (PE-ALD) processes were employed to prepare the Al2O3 thin films on plasticized polyvinyl chloride (PVC) surfaces at a low deposition temperature of 80 °C. The water contact angle test shows that the T-ALD Al2O3 films exhibited a hydrophobic surface, while the PE-ALD Al2O3 films were hydrophilic. The difference in the surface hydrophobicity is attributed to the carbon residue in Al2O3 films, as revealed by the X-ray photoelectron and Fourier transform infrared spectroscopies. The trend of hydrophobicity follows with the evolution of surface roughness of the T-Al2O3 films, indicating that the surface roughness contributed to the hydrophobicity as predicted by the Wenzel's mode. The result indicates that the surface hydrophilicity/hydrophobicity of the Al2O3 thin films can be modified and controlled by the deposition conditions of the ALD process.
原文英語
頁(從 - 到)158-164
頁數7
期刊Surface and Coatings Technology
305
DOIs
出版狀態已發佈 - 十一月 15 2016

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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