Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)

Li Chun Wang, Yin Yi Han, Kai Chiang Yang, Miin Jang Chen, Hsin Chih Lin, Chung Kwei Lin, Yu Tong Hsu

研究成果: 雜誌貢獻文章

11 引文 (Scopus)

摘要

Thermal ALD (T-ALD) and plasma-enhanced ALD (PE-ALD) processes were employed to prepare the Al2O3 thin films on plasticized polyvinyl chloride (PVC) surfaces at a low deposition temperature of 80 °C. The water contact angle test shows that the T-ALD Al2O3 films exhibited a hydrophobic surface, while the PE-ALD Al2O3 films were hydrophilic. The difference in the surface hydrophobicity is attributed to the carbon residue in Al2O3 films, as revealed by the X-ray photoelectron and Fourier transform infrared spectroscopies. The trend of hydrophobicity follows with the evolution of surface roughness of the T-Al2O3 films, indicating that the surface roughness contributed to the hydrophobicity as predicted by the Wenzel's mode. The result indicates that the surface hydrophilicity/hydrophobicity of the Al2O3 thin films can be modified and controlled by the deposition conditions of the ALD process.
原文英語
頁(從 - 到)158-164
頁數7
期刊Surface and Coatings Technology
305
DOIs
出版狀態已發佈 - 十一月 15 2016

指紋

Plasma Gases
polyvinyl chloride
Atomic layer deposition
Hydrophobicity
hydrophobicity
atomic layer epitaxy
Polyvinyl Chloride
Polyvinyl chlorides
Plasmas
Thin films
thin films
surface roughness
Surface roughness
Hydrophilicity
Photoelectrons
Contact angle
Fourier transform infrared spectroscopy
photoelectrons
Carbon
infrared spectroscopy

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

引用此文

Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC). / Wang, Li Chun; Han, Yin Yi; Yang, Kai Chiang; Chen, Miin Jang; Lin, Hsin Chih; Lin, Chung Kwei; Hsu, Yu Tong.

於: Surface and Coatings Technology, 卷 305, 15.11.2016, p. 158-164.

研究成果: 雜誌貢獻文章

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abstract = "Thermal ALD (T-ALD) and plasma-enhanced ALD (PE-ALD) processes were employed to prepare the Al2O3 thin films on plasticized polyvinyl chloride (PVC) surfaces at a low deposition temperature of 80 °C. The water contact angle test shows that the T-ALD Al2O3 films exhibited a hydrophobic surface, while the PE-ALD Al2O3 films were hydrophilic. The difference in the surface hydrophobicity is attributed to the carbon residue in Al2O3 films, as revealed by the X-ray photoelectron and Fourier transform infrared spectroscopies. The trend of hydrophobicity follows with the evolution of surface roughness of the T-Al2O3 films, indicating that the surface roughness contributed to the hydrophobicity as predicted by the Wenzel's mode. The result indicates that the surface hydrophilicity/hydrophobicity of the Al2O3 thin films can be modified and controlled by the deposition conditions of the ALD process.",
keywords = "Alumina, Atomic layer deposition, Hydrophilicity, Hydrophobicity, Polyvinyl chloride, Surface modification",
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AU - Wang, Li Chun

AU - Han, Yin Yi

AU - Yang, Kai Chiang

AU - Chen, Miin Jang

AU - Lin, Hsin Chih

AU - Lin, Chung Kwei

AU - Hsu, Yu Tong

PY - 2016/11/15

Y1 - 2016/11/15

N2 - Thermal ALD (T-ALD) and plasma-enhanced ALD (PE-ALD) processes were employed to prepare the Al2O3 thin films on plasticized polyvinyl chloride (PVC) surfaces at a low deposition temperature of 80 °C. The water contact angle test shows that the T-ALD Al2O3 films exhibited a hydrophobic surface, while the PE-ALD Al2O3 films were hydrophilic. The difference in the surface hydrophobicity is attributed to the carbon residue in Al2O3 films, as revealed by the X-ray photoelectron and Fourier transform infrared spectroscopies. The trend of hydrophobicity follows with the evolution of surface roughness of the T-Al2O3 films, indicating that the surface roughness contributed to the hydrophobicity as predicted by the Wenzel's mode. The result indicates that the surface hydrophilicity/hydrophobicity of the Al2O3 thin films can be modified and controlled by the deposition conditions of the ALD process.

AB - Thermal ALD (T-ALD) and plasma-enhanced ALD (PE-ALD) processes were employed to prepare the Al2O3 thin films on plasticized polyvinyl chloride (PVC) surfaces at a low deposition temperature of 80 °C. The water contact angle test shows that the T-ALD Al2O3 films exhibited a hydrophobic surface, while the PE-ALD Al2O3 films were hydrophilic. The difference in the surface hydrophobicity is attributed to the carbon residue in Al2O3 films, as revealed by the X-ray photoelectron and Fourier transform infrared spectroscopies. The trend of hydrophobicity follows with the evolution of surface roughness of the T-Al2O3 films, indicating that the surface roughness contributed to the hydrophobicity as predicted by the Wenzel's mode. The result indicates that the surface hydrophilicity/hydrophobicity of the Al2O3 thin films can be modified and controlled by the deposition conditions of the ALD process.

KW - Alumina

KW - Atomic layer deposition

KW - Hydrophilicity

KW - Hydrophobicity

KW - Polyvinyl chloride

KW - Surface modification

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