Conventional diagnoses of genetic mutation and disease depend on the analysis of DNA sequences. However, mismatches in the DNA sequences are difficult to detect using tradi- tional sequencing. Doping metal ions, such as nickel, into the short DNA (28 mer ~ 30 mer), markedly reduces its electrical resistance, which is measured by electrical impedance analysis. The change in resistance that is caused by a mismatched base-pair in short DNA can also be monitored by this approach. In this study, the resistance increased exponentially with the number of mismatched base-pairs. Accordingly, an intuitive and direct method for evaluating the number of DNA mismatches can possibly be developed.
|頁（從 - 到）||740-747|
|期刊||Chinese Journal of Physics|
|出版狀態||已發佈 - 十月 2009|
ASJC Scopus subject areas
- Physics and Astronomy(all)
Jangjian, P. C., Liu, T. F., Tsai, C. M., Li, M. Y., Tsai, M. S., Tseng, S. H., Cheng, T. M., & Chang, C. C. (2009). DNA mismatch detection by metal ion enhanced impedance analysis. Chinese Journal of Physics, 47(5), 740-747.