DNA mismatch detection by metal ion enhanced impedance analysis

Peng Chung Jangjian, Tzeng Feng Liu, Chuan Mei Tsai, Mei Yi Li, Ming Shih Tsai, Shin Hua Tseng, Tsai Mu Cheng, Chia Ching Chang

研究成果: 雜誌貢獻文章

7 引文 斯高帕斯(Scopus)

摘要

Conventional diagnoses of genetic mutation and disease depend on the analysis of DNA sequences. However, mismatches in the DNA sequences are difficult to detect using tradi- tional sequencing. Doping metal ions, such as nickel, into the short DNA (28 mer ~ 30 mer), markedly reduces its electrical resistance, which is measured by electrical impedance analysis. The change in resistance that is caused by a mismatched base-pair in short DNA can also be monitored by this approach. In this study, the resistance increased exponentially with the number of mismatched base-pairs. Accordingly, an intuitive and direct method for evaluating the number of DNA mismatches can possibly be developed.
原文英語
頁(從 - 到)740-747
頁數8
期刊Chinese Journal of Physics
47
發行號5
出版狀態已發佈 - 十月 2009
對外發佈Yes

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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  • 引用此

    Jangjian, P. C., Liu, T. F., Tsai, C. M., Li, M. Y., Tsai, M. S., Tseng, S. H., Cheng, T. M., & Chang, C. C. (2009). DNA mismatch detection by metal ion enhanced impedance analysis. Chinese Journal of Physics, 47(5), 740-747.