Correction: Formation and characterization of the high precision nanoscale thin film resistors on radio frequency application [Int. J. Electrochem. Sci., 10 (2015) (6517-6526)]

Huei Yu Huang, Chia-Yu Wu, Chi Chang Wu

研究成果: 雜誌貢獻評論/辯論

摘要

This was not noticed at the time by the authors and it is corrected by this correction now, and we apologize for any inconvenience this may cause.

原文英語
頁(從 - 到)6155
頁數1
期刊International Journal of Electrochemical Science
13
發行號6
DOIs
出版狀態已發佈 - 六月 1 2018

指紋

Resistors
Thin films

ASJC Scopus subject areas

  • Electrochemistry

引用此文

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title = "Correction: Formation and characterization of the high precision nanoscale thin film resistors on radio frequency application [Int. J. Electrochem. Sci., 10 (2015) (6517-6526)]",
abstract = "This was not noticed at the time by the authors and it is corrected by this correction now, and we apologize for any inconvenience this may cause.",
author = "Huang, {Huei Yu} and Chia-Yu Wu and Wu, {Chi Chang}",
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TY - JOUR

T1 - Correction

T2 - Formation and characterization of the high precision nanoscale thin film resistors on radio frequency application [Int. J. Electrochem. Sci., 10 (2015) (6517-6526)]

AU - Huang, Huei Yu

AU - Wu, Chia-Yu

AU - Wu, Chi Chang

PY - 2018/6/1

Y1 - 2018/6/1

N2 - This was not noticed at the time by the authors and it is corrected by this correction now, and we apologize for any inconvenience this may cause.

AB - This was not noticed at the time by the authors and it is corrected by this correction now, and we apologize for any inconvenience this may cause.

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DO - 10.20964/2018.06.200

M3 - Comment/debate

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SP - 6155

JO - International Journal of Electrochemical Science

JF - International Journal of Electrochemical Science

SN - 1452-3981

IS - 6

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