Correction: Formation and characterization of the high precision nanoscale thin film resistors on radio frequency application [Int. J. Electrochem. Sci., 10 (2015) (6517-6526)]

Huei Yu Huang, Chia-Yu Wu, Chi Chang Wu

研究成果: 雜誌貢獻 › 評論/辯論

摘要

This was not noticed at the time by the authors and it is corrected by this correction now, and we apologize for any inconvenience this may cause.

原文英語
頁（從 - 到）6155
頁數1
期刊International Journal of Electrochemical Science
卷13
發行號6
DOIs
出版狀態已發佈 - 六月 1 2018

指紋

Resistors
Thin films

ASJC Scopus subject areas

  • Electrochemistry

引用此文

Correction : Formation and characterization of the high precision nanoscale thin film resistors on radio frequency application [Int. J. Electrochem. Sci., 10 (2015) (6517-6526)]. / Huang, Huei Yu; Wu, Chia-Yu; Wu, Chi Chang.

於: International Journal of Electrochemical Science, 卷 13, 編號 6, 01.06.2018, p. 6155.

研究成果: 雜誌貢獻 › 評論/辯論

Huang, HY, Wu, C-Y & Wu, CC 2018, 'Correction: Formation and characterization of the high precision nanoscale thin film resistors on radio frequency application [Int. J. Electrochem. Sci., 10 (2015) (6517-6526)]', International Journal of Electrochemical Science, 卷 13, 編號 6, 頁 6155. https://doi.org/10.20964/2018.06.200
Huang HY, Wu C-Y, Wu CC. Correction: Formation and characterization of the high precision nanoscale thin film resistors on radio frequency application [Int. J. Electrochem. Sci., 10 (2015) (6517-6526)]. International Journal of Electrochemical Science. 2018 6月 1;13(6):6155. https://doi.org/10.20964/2018.06.200
Huang, Huei Yu ; Wu, Chia-Yu ; Wu, Chi Chang. / Correction : Formation and characterization of the high precision nanoscale thin film resistors on radio frequency application [Int. J. Electrochem. Sci., 10 (2015) (6517-6526)]. 於: International Journal of Electrochemical Science. 2018 ; 卷 13, 編號 6. 頁 6155.
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