Characterization of electrochromic tungsten oxide film from electrochemical anodized RF-sputtered tungsten films

Chun Kai Wang, Chung Kwei Lin, Ching Lin Wu, Sanjaya Brahma, Sheng Chang Wang, Jow Lay Huang

研究成果: 雜誌貢獻文章

22 引文 (Scopus)

摘要

Tungsten oxide (WO3) films prepared by annealing electrochemically anodized metallic tungsten (W) films deposited by radio-frequency sputtering were characterized. Tungsten oxide films of various morphology, crystallinity, and porosity can be prepared by carefully altering the anodization time (20-50 min) and annealing temperature (450-550 °C). The film obtained after 40 min of anodization, and that annealed at 500 °C shows the best electrochromic performance with optical modulation of 43.6% and coloration efficiency of 42.8 cm2/C. The effects of anodization time and annealing temperature on microstructure and electrochromic properties were addressed.
原文英語
頁(從 - 到)4293-4298
頁數6
期刊Ceramics International
39
發行號4
DOIs
出版狀態已發佈 - 五月 2013

指紋

Tungsten
Oxide films
Annealing
Light modulation
Sputtering
Porosity
Temperature
Microstructure
tungsten oxide

ASJC Scopus subject areas

  • Ceramics and Composites
  • Process Chemistry and Technology
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Materials Chemistry

引用此文

Characterization of electrochromic tungsten oxide film from electrochemical anodized RF-sputtered tungsten films. / Wang, Chun Kai; Lin, Chung Kwei; Wu, Ching Lin; Brahma, Sanjaya; Wang, Sheng Chang; Huang, Jow Lay.

於: Ceramics International, 卷 39, 編號 4, 05.2013, p. 4293-4298.

研究成果: 雜誌貢獻文章

Wang, Chun Kai ; Lin, Chung Kwei ; Wu, Ching Lin ; Brahma, Sanjaya ; Wang, Sheng Chang ; Huang, Jow Lay. / Characterization of electrochromic tungsten oxide film from electrochemical anodized RF-sputtered tungsten films. 於: Ceramics International. 2013 ; 卷 39, 編號 4. 頁 4293-4298.
@article{aca0e607916941168b31e96aa2cf4e7c,
title = "Characterization of electrochromic tungsten oxide film from electrochemical anodized RF-sputtered tungsten films",
abstract = "Tungsten oxide (WO3) films prepared by annealing electrochemically anodized metallic tungsten (W) films deposited by radio-frequency sputtering were characterized. Tungsten oxide films of various morphology, crystallinity, and porosity can be prepared by carefully altering the anodization time (20-50 min) and annealing temperature (450-550 °C). The film obtained after 40 min of anodization, and that annealed at 500 °C shows the best electrochromic performance with optical modulation of 43.6{\%} and coloration efficiency of 42.8 cm2/C. The effects of anodization time and annealing temperature on microstructure and electrochromic properties were addressed.",
keywords = "Electrochemical anodization, Electrochromism, Tungsten oxide film",
author = "Wang, {Chun Kai} and Lin, {Chung Kwei} and Wu, {Ching Lin} and Sanjaya Brahma and Wang, {Sheng Chang} and Huang, {Jow Lay}",
year = "2013",
month = "5",
doi = "10.1016/j.ceramint.2012.11.010",
language = "English",
volume = "39",
pages = "4293--4298",
journal = "Ceramics International",
issn = "0272-8842",
publisher = "Elsevier Limited",
number = "4",

}

TY - JOUR

T1 - Characterization of electrochromic tungsten oxide film from electrochemical anodized RF-sputtered tungsten films

AU - Wang, Chun Kai

AU - Lin, Chung Kwei

AU - Wu, Ching Lin

AU - Brahma, Sanjaya

AU - Wang, Sheng Chang

AU - Huang, Jow Lay

PY - 2013/5

Y1 - 2013/5

N2 - Tungsten oxide (WO3) films prepared by annealing electrochemically anodized metallic tungsten (W) films deposited by radio-frequency sputtering were characterized. Tungsten oxide films of various morphology, crystallinity, and porosity can be prepared by carefully altering the anodization time (20-50 min) and annealing temperature (450-550 °C). The film obtained after 40 min of anodization, and that annealed at 500 °C shows the best electrochromic performance with optical modulation of 43.6% and coloration efficiency of 42.8 cm2/C. The effects of anodization time and annealing temperature on microstructure and electrochromic properties were addressed.

AB - Tungsten oxide (WO3) films prepared by annealing electrochemically anodized metallic tungsten (W) films deposited by radio-frequency sputtering were characterized. Tungsten oxide films of various morphology, crystallinity, and porosity can be prepared by carefully altering the anodization time (20-50 min) and annealing temperature (450-550 °C). The film obtained after 40 min of anodization, and that annealed at 500 °C shows the best electrochromic performance with optical modulation of 43.6% and coloration efficiency of 42.8 cm2/C. The effects of anodization time and annealing temperature on microstructure and electrochromic properties were addressed.

KW - Electrochemical anodization

KW - Electrochromism

KW - Tungsten oxide film

UR - http://www.scopus.com/inward/record.url?scp=84874661782&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84874661782&partnerID=8YFLogxK

U2 - 10.1016/j.ceramint.2012.11.010

DO - 10.1016/j.ceramint.2012.11.010

M3 - Article

AN - SCOPUS:84874661782

VL - 39

SP - 4293

EP - 4298

JO - Ceramics International

JF - Ceramics International

SN - 0272-8842

IS - 4

ER -