Characterisation of structured thin films made from complex materials by photoabsorption spectromicroscopy

W. Swiech, G. H. Fecher, M. Huth, O. Schmidt, N. F. Cheng, C. K. Lin, C. Y. Tung, Y. Hwu

研究成果: 雜誌貢獻文章同行評審

7 引文 斯高帕斯(Scopus)

摘要

We used imaging spectromicroscopy to characterise micro-patterned thin films of complex materials such as UPd2Al3 and YBa2Cu3O7/PrBa2Cu3O 7. To investigate devices built from these complex materials we applied element-sensitive photoemission electron microscopy (PEEM). Information about the chemical composition of the imaged sample can be obtained by PEEM via tuning the photon energy to X-ray absorption edges. To apply spectromicroscopy we acquired microscopic images using photon energies near and at the edges. Such images give the lateral distribution of a specific element. Microspectroscopy is performed by recording the intensity of the true secondary electrons in selected spots during a sweep of the photon energy. The main aim of our work was to observe oxygen-related defects and changes in the composition affecting the physical properties of the materials. Therefore, we applied both methods to micro-patterned devices using soft-X-ray synchrotron radiation and found that small local defects and chemical differences can be easily detected. Such defects and chemical differences are quite critical to the physical properties of the devices, since they simulate spurious effects thus influencing the reliability of the devices.
原文英語
頁(從 - 到)447-454
頁數8
期刊Applied Physics A: Materials Science and Processing
67
發行號4
DOIs
出版狀態已發佈 - 1998
對外發佈

ASJC Scopus subject areas

  • 化學 (全部)
  • 材料科學(全部)

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