Arsenic exposure and methylation efficiency in relation to oxidative stress in semiconductor workers

Chih Hong Pan, Ching Yu Lin, Ching Huang Lai, Hueiwang Anna Jeng

研究成果: 雜誌貢獻文章同行評審

1 引文 斯高帕斯(Scopus)

指紋 深入研究「Arsenic exposure and methylation efficiency in relation to oxidative stress in semiconductor workers」主題。共同形成了獨特的指紋。

Earth & Environmental Sciences