Application of ozone related processes to mineralize tetramethyl ammonium hydroxide in aqueous solution

Chyow San Chiou, Kai Jen Chuang, Ya Fen Lin, Hua Wei Chen, Chih Ming Ma

研究成果: 雜誌貢獻文章

6 引文 (Scopus)

摘要

Tetramethyl ammonium hydroxide (TMAH) is an anisotropic etchant used in the wet etching process of the semiconductor industry and is hard to degrade by biotreatments when it exists in wastewater. This study evaluated the performance of a system combined with ultraviolet, magnetic catalyst (SiO 2/Fe3O4) and O3, denoted as UV/O3, to TMAH in an aqueous solution. The mineralization efficiency of TMAH under various conditions follows the sequence: UV/O3 > UV/H2O2/O3 > H2O 2/SiO2/Fe3O4/O3 > H2O2/O3 > SiO2/Fe 3O4/O3 > O3 > UV/H 2O2. The results suggest that UV/O3 process provides the best condition for the mineralization of TMAH (40 mg/L), resulting in 87.6% mineralization, at 60 min reaction time. Furthermore, the mineralization efficiency of SiO2/Fe3O4/H 2O2/O3 was significantly higher than that of O3, H2O2/O3, and UV/H 2O2. More than 90% of the magnetic catalyst was recovered and easily redispersed in a solution for reuse.

原文英語
文章編號191742
期刊International Journal of Photoenergy
2013
DOIs
出版狀態已發佈 - 2013

指紋

Ammonium Hydroxide
Ammonium hydroxide
Ozone
ozone
hydroxides
aqueous solutions
catalysts
Catalysts
etchants
Wet etching
reuse
reaction time
Wastewater
industries
etching
Semiconductor materials
Industry

ASJC Scopus subject areas

  • Renewable Energy, Sustainability and the Environment
  • Chemistry(all)
  • Atomic and Molecular Physics, and Optics
  • Materials Science(all)

引用此文

Application of ozone related processes to mineralize tetramethyl ammonium hydroxide in aqueous solution. / Chiou, Chyow San; Chuang, Kai Jen; Lin, Ya Fen; Chen, Hua Wei; Ma, Chih Ming.

於: International Journal of Photoenergy, 卷 2013, 191742, 2013.

研究成果: 雜誌貢獻文章

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abstract = "Tetramethyl ammonium hydroxide (TMAH) is an anisotropic etchant used in the wet etching process of the semiconductor industry and is hard to degrade by biotreatments when it exists in wastewater. This study evaluated the performance of a system combined with ultraviolet, magnetic catalyst (SiO 2/Fe3O4) and O3, denoted as UV/O3, to TMAH in an aqueous solution. The mineralization efficiency of TMAH under various conditions follows the sequence: UV/O3 > UV/H2O2/O3 > H2O 2/SiO2/Fe3O4/O3 > H2O2/O3 > SiO2/Fe 3O4/O3 > O3 > UV/H 2O2. The results suggest that UV/O3 process provides the best condition for the mineralization of TMAH (40 mg/L), resulting in 87.6{\%} mineralization, at 60 min reaction time. Furthermore, the mineralization efficiency of SiO2/Fe3O4/H 2O2/O3 was significantly higher than that of O3, H2O2/O3, and UV/H 2O2. More than 90{\%} of the magnetic catalyst was recovered and easily redispersed in a solution for reuse.",
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AU - Ma, Chih Ming

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N2 - Tetramethyl ammonium hydroxide (TMAH) is an anisotropic etchant used in the wet etching process of the semiconductor industry and is hard to degrade by biotreatments when it exists in wastewater. This study evaluated the performance of a system combined with ultraviolet, magnetic catalyst (SiO 2/Fe3O4) and O3, denoted as UV/O3, to TMAH in an aqueous solution. The mineralization efficiency of TMAH under various conditions follows the sequence: UV/O3 > UV/H2O2/O3 > H2O 2/SiO2/Fe3O4/O3 > H2O2/O3 > SiO2/Fe 3O4/O3 > O3 > UV/H 2O2. The results suggest that UV/O3 process provides the best condition for the mineralization of TMAH (40 mg/L), resulting in 87.6% mineralization, at 60 min reaction time. Furthermore, the mineralization efficiency of SiO2/Fe3O4/H 2O2/O3 was significantly higher than that of O3, H2O2/O3, and UV/H 2O2. More than 90% of the magnetic catalyst was recovered and easily redispersed in a solution for reuse.

AB - Tetramethyl ammonium hydroxide (TMAH) is an anisotropic etchant used in the wet etching process of the semiconductor industry and is hard to degrade by biotreatments when it exists in wastewater. This study evaluated the performance of a system combined with ultraviolet, magnetic catalyst (SiO 2/Fe3O4) and O3, denoted as UV/O3, to TMAH in an aqueous solution. The mineralization efficiency of TMAH under various conditions follows the sequence: UV/O3 > UV/H2O2/O3 > H2O 2/SiO2/Fe3O4/O3 > H2O2/O3 > SiO2/Fe 3O4/O3 > O3 > UV/H 2O2. The results suggest that UV/O3 process provides the best condition for the mineralization of TMAH (40 mg/L), resulting in 87.6% mineralization, at 60 min reaction time. Furthermore, the mineralization efficiency of SiO2/Fe3O4/H 2O2/O3 was significantly higher than that of O3, H2O2/O3, and UV/H 2O2. More than 90% of the magnetic catalyst was recovered and easily redispersed in a solution for reuse.

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