Analysis on microstructure and characteristics of TiAlN/CrN nano-multilayer films deposited by cathodic arc deposition

P. L. Sun, C. H. Hsu, S. H. Liu, C. Y. Su, C. K. Lin

研究成果: 雜誌貢獻文章同行評審

29 引文 斯高帕斯(Scopus)

摘要

In this study, TiAlN/CrN multilayer thin films were deposited on SUS 403 stainless steel by cathodic arc deposition. The effects of substrate orientation (substrate surface parallel/perpendicular to target surface) and rotation speed were investigated in detail. Microstructure of the coatings was analyzed by X-ray diffraction, X-ray photoelectron spectroscopy and scanning electron microscopy. Meanwhile, tribological and corrosion tests were performed. The experimental results showed that the as-deposited films exhibit a nano-scale multilayer structure consisting of TiAlN and CrN phases. The TiAlN/CrN multilayer films prepared by a parallel orientation and a rotation speed of 4 rpm not only possesses the best coating hardness and hardness/elastic modulus ratio, but also reveals superior abrasion resistance and corrosion resistance.
原文英語
頁(從 - 到)7519-7522
頁數4
期刊Thin Solid Films
518
發行號24
DOIs
出版狀態已發佈 - 10月 1 2010
對外發佈

ASJC Scopus subject areas

  • 電子、光磁材料
  • 材料化學
  • 金屬和合金
  • 表面、塗料和薄膜
  • 表面和介面

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