Well aligned ultrasharp nanotip arrays for high-efficiency field emission

Chi-Chang Wu, Keng-Liang Ou, Chung Huan Shieh

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We have fabricated a large area and well aligned ultrasharp nanotip arrays by using photolithography and reactive ion etching techniques. The apex of the tip can be as sharp as about 3 nm in radius. The mechanism of nanotip formation is that the remained photoresist on top of the tip is gradually reduced with increasing the etching time, and hence sidewall of the tip is pared to form a pointier nanotip. At the end, the photoresist is fully etched away and a pyramid-like shape is formed at the tip-end due to the etch probability of incident ion on the sidewall. The field emission property of the ultrasharp nanotip is measured, and the turn-on field is about 20 MV-cm.

Original languageEnglish
Title of host publicationProceedings - International NanoElectronics Conference, INEC
DOIs
Publication statusPublished - 2011
Event4th IEEE International Nanoelectronics Conference, INEC 2011 - Tao-Yuan, Taiwan
Duration: Jun 21 2011Jun 24 2011

Other

Other4th IEEE International Nanoelectronics Conference, INEC 2011
CountryTaiwan
CityTao-Yuan
Period6/21/116/24/11

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Keywords

  • field emission
  • nanotip
  • tip arrays
  • well-aligned

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

Cite this

Wu, C-C., Ou, K-L., & Shieh, C. H. (2011). Well aligned ultrasharp nanotip arrays for high-efficiency field emission. In Proceedings - International NanoElectronics Conference, INEC [5991758] https://doi.org/10.1109/INEC.2011.5991758