Ultrathin Ni-Mo-P diffusion barriers deposited using nonisothermal deposition method in acid bath

Yu Hsien Chou, Yuh Sung, Keng Liang Ou, Yih Ming Liu, Ming Der Ger

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

The performance and thermal stability of the ultrathin nickel-molybdenum- phosphorus (Ni-Mo-P) barrier layer deposited by the nonisothermal deposition method in acid electroless bath have been clearly investigated. The as-deposited Ni-Mo-P film (15 nm) has a low resistivity, contains high amounts of Mo (6.7 atom %) and P (25 atom %), and has an amorphous structure. The barrier capability of this Ni-Mo-P film remains stable up to 650°C for 1 h annealing. This reveals that the resistance of Ni-Mo-P barrier film against Cu diffusion is very prominent, and this method for depositing Ni-Mo-P films is extremely promising for ultralarge-scale integration application.

Original languageEnglish
JournalElectrochemical and Solid-State Letters
Volume11
Issue number2
DOIs
Publication statusPublished - 2008
Externally publishedYes

Fingerprint

Molybdenum
Diffusion barriers
Nickel
Phosphorus
molybdenum
phosphorus
baths
nickel
acids
Acids
Atoms
barrier layers
atoms
Thermodynamic stability
thermal stability
Annealing
electrical resistivity
annealing

ASJC Scopus subject areas

  • Electrochemistry
  • Materials Science(all)

Cite this

Ultrathin Ni-Mo-P diffusion barriers deposited using nonisothermal deposition method in acid bath. / Chou, Yu Hsien; Sung, Yuh; Ou, Keng Liang; Liu, Yih Ming; Ger, Ming Der.

In: Electrochemical and Solid-State Letters, Vol. 11, No. 2, 2008.

Research output: Contribution to journalArticle

Chou, Yu Hsien ; Sung, Yuh ; Ou, Keng Liang ; Liu, Yih Ming ; Ger, Ming Der. / Ultrathin Ni-Mo-P diffusion barriers deposited using nonisothermal deposition method in acid bath. In: Electrochemical and Solid-State Letters. 2008 ; Vol. 11, No. 2.
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