Transparent Memory for Harsh Electronics

C. H. Ho, J. R.Durán Retamal, P. K. Yang, C. P. Lee, M. L. Tsai, C. F. Kang, Jr Hau He

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

As a new class of non-volatile memory, resistive random access memory (RRAM) offers not only superior electronic characteristics, but also advanced functionalities, such as transparency and radiation hardness. However, the environmental tolerance of RRAM is material-dependent, and therefore the materials used must be chosen carefully in order to avoid instabilities and performance degradation caused by the detrimental effects arising from environmental gases and ionizing radiation. In this work, we demonstrate that AlN-based RRAM displays excellent performance and environmental stability, with no significant degradation to the resistance ratio over a 100-cycle endurance test. Moreover, transparent RRAM (TRRAM) based on AlN also performs reliably under four different harsh environmental conditions and 2 MeV proton irradiation fluences, ranging from 10 11 to 10 15 cm â '2. These findings not only provide a guideline for TRRAM design, but also demonstrate the promising applicability of AlN TRRAM for future transparent harsh electronics.

Original languageEnglish
Article number44429
JournalScientific Reports
Volume7
DOIs
Publication statusPublished - Mar 14 2017
Externally publishedYes

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random access memory
electronics
degradation
proton irradiation
endurance
radiation
ionizing radiation
fluence
hardness
cycles
gases

ASJC Scopus subject areas

  • General

Cite this

Ho, C. H., Retamal, J. R. D., Yang, P. K., Lee, C. P., Tsai, M. L., Kang, C. F., & He, J. H. (2017). Transparent Memory for Harsh Electronics. Scientific Reports, 7, [44429]. https://doi.org/10.1038/srep44429

Transparent Memory for Harsh Electronics. / Ho, C. H.; Retamal, J. R.Durán; Yang, P. K.; Lee, C. P.; Tsai, M. L.; Kang, C. F.; He, Jr Hau.

In: Scientific Reports, Vol. 7, 44429, 14.03.2017.

Research output: Contribution to journalArticle

Ho, CH, Retamal, JRD, Yang, PK, Lee, CP, Tsai, ML, Kang, CF & He, JH 2017, 'Transparent Memory for Harsh Electronics', Scientific Reports, vol. 7, 44429. https://doi.org/10.1038/srep44429
Ho CH, Retamal JRD, Yang PK, Lee CP, Tsai ML, Kang CF et al. Transparent Memory for Harsh Electronics. Scientific Reports. 2017 Mar 14;7. 44429. https://doi.org/10.1038/srep44429
Ho, C. H. ; Retamal, J. R.Durán ; Yang, P. K. ; Lee, C. P. ; Tsai, M. L. ; Kang, C. F. ; He, Jr Hau. / Transparent Memory for Harsh Electronics. In: Scientific Reports. 2017 ; Vol. 7.
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