The effect of deposition parameters and post treatment on the electrical properties of Mo thin films

Cherng Yuh Su, Kuang Hsiang Liao, Cheng Tang Pan, Pei Wen Peng

Research output: Contribution to journalArticle

11 Citations (Scopus)


In this study, we deposited low-resistivity molybdenum (Mo) thin films on soda-lime glass substrates with good adhesion. We adjusted various deposition parameters such as the sputtering power (52-102 W), working distance (5.5-9 cm) and annealing temperature (26-400 °C) to investigate their impact on the sheet resistance. By using a DC magnetron sputtering system, we obtained Mo thin films having the lowest sheet resistance of 0.190 Ω/□ with a sputtering power of 82 W, working distance of 6.5 cm, and annealing temperature of 400 °C; in addition, these films had good adhesivity. These Mo thin films were suitable for use as the Mo back contact in Cu(In,Ga)Se 2-based solar cells.

Original languageEnglish
Pages (from-to)5936-5939
Number of pages4
JournalThin Solid Films
Issue number18
Publication statusPublished - Jul 1 2012



  • Annealing temperature
  • Molybdenum
  • Sheet resistance
  • Solar cell back contact
  • Sputtering power
  • Working distance
  • X-ray diffraction

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Metals and Alloys
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

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