Research of microstructural characteristics on nanocrystalline diamond by microwave plasma CVD

Jing Ming Hung, Li Hsiang Lin, Yung Hsun Shih, Chung Ming Liu, Hsin Chung Cheng, Keng Liang Ou

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

In this study, the nanocrystalline diamond (NCD) films were carried out by microwave plasma chemical vapor deposition (CVD) with CH4/Ar/H 2 gas concoction on Si substrate at moderate temperatures. The characteristics of NCD films were evaluated using scanning electron microscopy, Raman spectroscopy, transmission electron microscopy, optical emission spectroscopy and optical contact angle meter. The analytical results revealed that C2 radial was the dominant species in the deposited process. From TEM observation, the NCD films were formed via the etching of hydrocarbons and a small amount of H2 content additive into gas mixture has improved the aggregation of the nucleation film to form the NCD films. The more hydrophobic surfaces imply that NCD films are the potential biomaterial in the application of article heart valve or stent.

Original languageEnglish
Pages (from-to)5508-5512
Number of pages5
JournalApplied Surface Science
Volume257
Issue number13
DOIs
Publication statusPublished - Apr 15 2011

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Keywords

  • Chemical vapor deposition
  • Microstructure
  • Microwave plasma
  • Nanocrystalline diamond
  • Wettability

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

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