Research of microstructural characteristics on nanocrystalline diamond by microwave plasma CVD

Jing Ming Hung, Li Hsiang Lin, Yung Hsun Shih, Chung Ming Liu, Hsin Chung Cheng, Keng Liang Ou

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

In this study, the nanocrystalline diamond (NCD) films were carried out by microwave plasma chemical vapor deposition (CVD) with CH4/Ar/H 2 gas concoction on Si substrate at moderate temperatures. The characteristics of NCD films were evaluated using scanning electron microscopy, Raman spectroscopy, transmission electron microscopy, optical emission spectroscopy and optical contact angle meter. The analytical results revealed that C2 radial was the dominant species in the deposited process. From TEM observation, the NCD films were formed via the etching of hydrocarbons and a small amount of H2 content additive into gas mixture has improved the aggregation of the nucleation film to form the NCD films. The more hydrophobic surfaces imply that NCD films are the potential biomaterial in the application of article heart valve or stent.

Original languageEnglish
Pages (from-to)5508-5512
Number of pages5
JournalApplied Surface Science
Volume257
Issue number13
DOIs
Publication statusPublished - Apr 15 2011

Fingerprint

Diamond
Diamond films
Chemical vapor deposition
Diamonds
Microwaves
Plasmas
Transmission electron microscopy
Optical emission spectroscopy
Stents
Biocompatible Materials
Hydrocarbons
Biomaterials
Gas mixtures
Contact angle
Raman spectroscopy
Etching
Nucleation
Agglomeration
Gases
Scanning electron microscopy

Keywords

  • Chemical vapor deposition
  • Microstructure
  • Microwave plasma
  • Nanocrystalline diamond
  • Wettability

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

Cite this

Research of microstructural characteristics on nanocrystalline diamond by microwave plasma CVD. / Hung, Jing Ming; Lin, Li Hsiang; Shih, Yung Hsun; Liu, Chung Ming; Cheng, Hsin Chung; Ou, Keng Liang.

In: Applied Surface Science, Vol. 257, No. 13, 15.04.2011, p. 5508-5512.

Research output: Contribution to journalArticle

Hung, Jing Ming ; Lin, Li Hsiang ; Shih, Yung Hsun ; Liu, Chung Ming ; Cheng, Hsin Chung ; Ou, Keng Liang. / Research of microstructural characteristics on nanocrystalline diamond by microwave plasma CVD. In: Applied Surface Science. 2011 ; Vol. 257, No. 13. pp. 5508-5512.
@article{f5f442d0ae2344c1825850b9673b98ba,
title = "Research of microstructural characteristics on nanocrystalline diamond by microwave plasma CVD",
abstract = "In this study, the nanocrystalline diamond (NCD) films were carried out by microwave plasma chemical vapor deposition (CVD) with CH4/Ar/H 2 gas concoction on Si substrate at moderate temperatures. The characteristics of NCD films were evaluated using scanning electron microscopy, Raman spectroscopy, transmission electron microscopy, optical emission spectroscopy and optical contact angle meter. The analytical results revealed that C2 radial was the dominant species in the deposited process. From TEM observation, the NCD films were formed via the etching of hydrocarbons and a small amount of H2 content additive into gas mixture has improved the aggregation of the nucleation film to form the NCD films. The more hydrophobic surfaces imply that NCD films are the potential biomaterial in the application of article heart valve or stent.",
keywords = "Chemical vapor deposition, Microstructure, Microwave plasma, Nanocrystalline diamond, Wettability",
author = "Hung, {Jing Ming} and Lin, {Li Hsiang} and Shih, {Yung Hsun} and Liu, {Chung Ming} and Cheng, {Hsin Chung} and Ou, {Keng Liang}",
year = "2011",
month = "4",
day = "15",
doi = "10.1016/j.apsusc.2010.12.134",
language = "English",
volume = "257",
pages = "5508--5512",
journal = "Applied Surface Science",
issn = "0169-4332",
publisher = "Elsevier B.V.",
number = "13",

}

TY - JOUR

T1 - Research of microstructural characteristics on nanocrystalline diamond by microwave plasma CVD

AU - Hung, Jing Ming

AU - Lin, Li Hsiang

AU - Shih, Yung Hsun

AU - Liu, Chung Ming

AU - Cheng, Hsin Chung

AU - Ou, Keng Liang

PY - 2011/4/15

Y1 - 2011/4/15

N2 - In this study, the nanocrystalline diamond (NCD) films were carried out by microwave plasma chemical vapor deposition (CVD) with CH4/Ar/H 2 gas concoction on Si substrate at moderate temperatures. The characteristics of NCD films were evaluated using scanning electron microscopy, Raman spectroscopy, transmission electron microscopy, optical emission spectroscopy and optical contact angle meter. The analytical results revealed that C2 radial was the dominant species in the deposited process. From TEM observation, the NCD films were formed via the etching of hydrocarbons and a small amount of H2 content additive into gas mixture has improved the aggregation of the nucleation film to form the NCD films. The more hydrophobic surfaces imply that NCD films are the potential biomaterial in the application of article heart valve or stent.

AB - In this study, the nanocrystalline diamond (NCD) films were carried out by microwave plasma chemical vapor deposition (CVD) with CH4/Ar/H 2 gas concoction on Si substrate at moderate temperatures. The characteristics of NCD films were evaluated using scanning electron microscopy, Raman spectroscopy, transmission electron microscopy, optical emission spectroscopy and optical contact angle meter. The analytical results revealed that C2 radial was the dominant species in the deposited process. From TEM observation, the NCD films were formed via the etching of hydrocarbons and a small amount of H2 content additive into gas mixture has improved the aggregation of the nucleation film to form the NCD films. The more hydrophobic surfaces imply that NCD films are the potential biomaterial in the application of article heart valve or stent.

KW - Chemical vapor deposition

KW - Microstructure

KW - Microwave plasma

KW - Nanocrystalline diamond

KW - Wettability

UR - http://www.scopus.com/inward/record.url?scp=79952515599&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=79952515599&partnerID=8YFLogxK

U2 - 10.1016/j.apsusc.2010.12.134

DO - 10.1016/j.apsusc.2010.12.134

M3 - Article

VL - 257

SP - 5508

EP - 5512

JO - Applied Surface Science

JF - Applied Surface Science

SN - 0169-4332

IS - 13

ER -