Pulsed laser deposition of (WO3)1 - X(Nb 2O5)x thin films

Characterization and gasochromic studies

Chia Hao Hsu, Chung Chieh Chang, Kuo Wei Yeh, Yu Ruei Wu, Chih Chieh Chan, Ming Jye Wang, Mau Kuen Wu

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

A series of (WO3)1 - x(Nb2O 5)x (x = 0, 0.05, 0.1 and 0.15) mixed oxide films were fabricated by pulsed laser deposition (PLD) at 27 Pa oxygen partial pressure on ITO glass substrates. The thickness of the (WO3) 1 - x(Nb2O5)x thin films is about 350 ± 30 nm and their surface has a uniform morphology. A layer of platinum (Pt) was then sputtered onto the surface of the film. The hydrogen gas sensing performance of Pt catalyst activated (WO3) 1 - x(Nb2O5)x thin films were investigated. The cycling of the coloration was obtained from UV-vis spectra. Gasochromic coloration of (WO3)1 - x(Nb2O 5)x thin films were investigated at room temperature in H2-N2 mixtures containing 1-100 mol% of H2. The results show that the shortest response time of (WO3) 1 - x(Nb2O5)x/Pt hydrogen sensor is within 30 s and the highest transmittance change (ΔT) varies from 20% to 30%.

Original languageEnglish
Pages (from-to)1470-1474
Number of pages5
JournalThin Solid Films
Volume520
Issue number5
DOIs
Publication statusPublished - Dec 30 2011
Externally publishedYes

Fingerprint

Pulsed laser deposition
Platinum
pulsed laser deposition
platinum
Thin films
Hydrogen
thin films
color
ITO glass
mixed oxides
hydrogen
ITO (semiconductors)
Partial pressure
Oxide films
partial pressure
oxide films
transmittance
Gases
Oxygen
catalysts

Keywords

  • Gasochromic
  • Hydrogen sensor
  • Niobium oxide
  • PLD
  • Tungsten oxide

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Metals and Alloys
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

Hsu, C. H., Chang, C. C., Yeh, K. W., Wu, Y. R., Chan, C. C., Wang, M. J., & Wu, M. K. (2011). Pulsed laser deposition of (WO3)1 - X(Nb 2O5)x thin films: Characterization and gasochromic studies. Thin Solid Films, 520(5), 1470-1474. https://doi.org/10.1016/j.tsf.2011.07.062

Pulsed laser deposition of (WO3)1 - X(Nb 2O5)x thin films : Characterization and gasochromic studies. / Hsu, Chia Hao; Chang, Chung Chieh; Yeh, Kuo Wei; Wu, Yu Ruei; Chan, Chih Chieh; Wang, Ming Jye; Wu, Mau Kuen.

In: Thin Solid Films, Vol. 520, No. 5, 30.12.2011, p. 1470-1474.

Research output: Contribution to journalArticle

Hsu, CH, Chang, CC, Yeh, KW, Wu, YR, Chan, CC, Wang, MJ & Wu, MK 2011, 'Pulsed laser deposition of (WO3)1 - X(Nb 2O5)x thin films: Characterization and gasochromic studies', Thin Solid Films, vol. 520, no. 5, pp. 1470-1474. https://doi.org/10.1016/j.tsf.2011.07.062
Hsu, Chia Hao ; Chang, Chung Chieh ; Yeh, Kuo Wei ; Wu, Yu Ruei ; Chan, Chih Chieh ; Wang, Ming Jye ; Wu, Mau Kuen. / Pulsed laser deposition of (WO3)1 - X(Nb 2O5)x thin films : Characterization and gasochromic studies. In: Thin Solid Films. 2011 ; Vol. 520, No. 5. pp. 1470-1474.
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