Pulsed laser deposition of (MoO3)1 - X(V 2O5)x thin films: Preparation, characterization and gasochromic studies

Chung Chieh Chang, Jiu Yong Luo, Ta Kun Chen, Kuo Wei Yeh, Tzu Wen Huang, Chia Hao Hsu, Wei Hsiang Chao, Chung Ting Ke, Po Chun Hsu, Ming Jye Wang, Mau Kuen Wu

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23 Citations (Scopus)

Abstract

In this study we demonstrate a new composite oxide thin films of (MoO 3)1 - x(V2O5)x, x = 0, 0.01, 0.03, and 0.05, fabricated by pulsed laser deposition (PLD). The performance of platinum (Pt) catalyst activated hydrogen gas sensor with modified (MoO3)1 - x(V2O5) x thin films were investigated. The thickness of the (MoO 3)1 - x(V2O5)x thin film is about 600-650 nm and its surface has a uniform morphology. Our results show that the gasochromic sensors prepared by (MoO3)0.99(V 2O5)0.01 thin film exhibited excellent hydrogen sensibility. The response and recovery time are in the range of 9-15 min for coloration and bleaching at room temperature under H2 atmosphere. The results also show that (MoO3)1 - x(V2O 5)x/Pt (x = 0.01, 0.03, 0.05) thin films perform better gasochromic capability than the pristine MoO3/Pt sample.

Original languageEnglish
Pages (from-to)1552-1557
Number of pages6
JournalThin Solid Films
Volume519
Issue number5
DOIs
Publication statusPublished - Dec 30 2010
Externally publishedYes

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Keywords

  • Hydrogen sensor
  • Molybdenum oxide
  • PLD
  • Vanadium oxide gasochromic

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Metals and Alloys
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

Chang, C. C., Luo, J. Y., Chen, T. K., Yeh, K. W., Huang, T. W., Hsu, C. H., Chao, W. H., Ke, C. T., Hsu, P. C., Wang, M. J., & Wu, M. K. (2010). Pulsed laser deposition of (MoO3)1 - X(V 2O5)x thin films: Preparation, characterization and gasochromic studies. Thin Solid Films, 519(5), 1552-1557. https://doi.org/10.1016/j.tsf.2010.09.003