Pulsed laser deposition of (MoO3)1 - X(V 2O5)x thin films: Preparation, characterization and gasochromic studies

Chung Chieh Chang, Jiu Yong Luo, Ta Kun Chen, Kuo Wei Yeh, Tzu Wen Huang, Chia Hao Hsu, Wei Hsiang Chao, Chung Ting Ke, Po Chun Hsu, Ming Jye Wang, Mau Kuen Wu

Research output: Contribution to journalArticle

20 Citations (Scopus)

Abstract

In this study we demonstrate a new composite oxide thin films of (MoO 3)1 - x(V2O5)x, x = 0, 0.01, 0.03, and 0.05, fabricated by pulsed laser deposition (PLD). The performance of platinum (Pt) catalyst activated hydrogen gas sensor with modified (MoO3)1 - x(V2O5) x thin films were investigated. The thickness of the (MoO 3)1 - x(V2O5)x thin film is about 600-650 nm and its surface has a uniform morphology. Our results show that the gasochromic sensors prepared by (MoO3)0.99(V 2O5)0.01 thin film exhibited excellent hydrogen sensibility. The response and recovery time are in the range of 9-15 min for coloration and bleaching at room temperature under H2 atmosphere. The results also show that (MoO3)1 - x(V2O 5)x/Pt (x = 0.01, 0.03, 0.05) thin films perform better gasochromic capability than the pristine MoO3/Pt sample.

Original languageEnglish
Pages (from-to)1552-1557
Number of pages6
JournalThin Solid Films
Volume519
Issue number5
DOIs
Publication statusPublished - Dec 30 2010
Externally publishedYes

Fingerprint

Film preparation
Pulsed laser deposition
pulsed laser deposition
Thin films
preparation
Platinum
thin films
platinum
Hydrogen
sensors
hydrogen
bleaching
Bleaching
Chemical sensors
Oxide films
recovery
molybdenum trioxide
color
catalysts
atmospheres

Keywords

  • Hydrogen sensor
  • Molybdenum oxide
  • PLD
  • Vanadium oxide gasochromic

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Metals and Alloys
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

Chang, C. C., Luo, J. Y., Chen, T. K., Yeh, K. W., Huang, T. W., Hsu, C. H., ... Wu, M. K. (2010). Pulsed laser deposition of (MoO3)1 - X(V 2O5)x thin films: Preparation, characterization and gasochromic studies. Thin Solid Films, 519(5), 1552-1557. https://doi.org/10.1016/j.tsf.2010.09.003

Pulsed laser deposition of (MoO3)1 - X(V 2O5)x thin films : Preparation, characterization and gasochromic studies. / Chang, Chung Chieh; Luo, Jiu Yong; Chen, Ta Kun; Yeh, Kuo Wei; Huang, Tzu Wen; Hsu, Chia Hao; Chao, Wei Hsiang; Ke, Chung Ting; Hsu, Po Chun; Wang, Ming Jye; Wu, Mau Kuen.

In: Thin Solid Films, Vol. 519, No. 5, 30.12.2010, p. 1552-1557.

Research output: Contribution to journalArticle

Chang, CC, Luo, JY, Chen, TK, Yeh, KW, Huang, TW, Hsu, CH, Chao, WH, Ke, CT, Hsu, PC, Wang, MJ & Wu, MK 2010, 'Pulsed laser deposition of (MoO3)1 - X(V 2O5)x thin films: Preparation, characterization and gasochromic studies', Thin Solid Films, vol. 519, no. 5, pp. 1552-1557. https://doi.org/10.1016/j.tsf.2010.09.003
Chang, Chung Chieh ; Luo, Jiu Yong ; Chen, Ta Kun ; Yeh, Kuo Wei ; Huang, Tzu Wen ; Hsu, Chia Hao ; Chao, Wei Hsiang ; Ke, Chung Ting ; Hsu, Po Chun ; Wang, Ming Jye ; Wu, Mau Kuen. / Pulsed laser deposition of (MoO3)1 - X(V 2O5)x thin films : Preparation, characterization and gasochromic studies. In: Thin Solid Films. 2010 ; Vol. 519, No. 5. pp. 1552-1557.
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AU - Yeh, Kuo Wei

AU - Huang, Tzu Wen

AU - Hsu, Chia Hao

AU - Chao, Wei Hsiang

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