Plasmon-enhanced optical nonlinearity for femtosecond all-optical switching

Kuidong Wang, Long Chen, Haijuan Zhang, Hui Hsin Hsiao, Din Ping Tsai, Jie Chen

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Ultrafast all-optical switching in metals can be an efficient way for high-speed active photonic devices. However, with the improvement in modulation speed, typically by reducing the optical switching pulse width from picoseconds to femtoseconds, the nonlinear optical response of the metal will decrease significantly, which hinders the realization of the sufficient modulation depth at femtosecond optical control. Here, by combining two optical nonlinear enhancement effects of surface plasmon polaritons, including their extreme sensitivity to refractive index change and their capability to induce strong localized optical fields, we have achieved an ∼50-times enhancement in the modulation depth simultaneously with a switching time of ∼75-fs. Such enhancement was found to be independent of the control intensity, which sets a basis for the future application of femtosecond switching at a minimum power.

Original languageEnglish
Article number181102
JournalApplied Physics Letters
Volume111
Issue number18
DOIs
Publication statusPublished - Oct 30 2017

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optical switching
nonlinearity
modulation
augmentation
optical control
polaritons
metals
pulse duration
high speed
photonics
refractivity
sensitivity

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Wang, K., Chen, L., Zhang, H., Hsiao, H. H., Tsai, D. P., & Chen, J. (2017). Plasmon-enhanced optical nonlinearity for femtosecond all-optical switching. Applied Physics Letters, 111(18), [181102]. https://doi.org/10.1063/1.5002581

Plasmon-enhanced optical nonlinearity for femtosecond all-optical switching. / Wang, Kuidong; Chen, Long; Zhang, Haijuan; Hsiao, Hui Hsin; Tsai, Din Ping; Chen, Jie.

In: Applied Physics Letters, Vol. 111, No. 18, 181102, 30.10.2017.

Research output: Contribution to journalArticle

Wang, K, Chen, L, Zhang, H, Hsiao, HH, Tsai, DP & Chen, J 2017, 'Plasmon-enhanced optical nonlinearity for femtosecond all-optical switching', Applied Physics Letters, vol. 111, no. 18, 181102. https://doi.org/10.1063/1.5002581
Wang, Kuidong ; Chen, Long ; Zhang, Haijuan ; Hsiao, Hui Hsin ; Tsai, Din Ping ; Chen, Jie. / Plasmon-enhanced optical nonlinearity for femtosecond all-optical switching. In: Applied Physics Letters. 2017 ; Vol. 111, No. 18.
@article{0be90b7de5ce4980ac582b968b920676,
title = "Plasmon-enhanced optical nonlinearity for femtosecond all-optical switching",
abstract = "Ultrafast all-optical switching in metals can be an efficient way for high-speed active photonic devices. However, with the improvement in modulation speed, typically by reducing the optical switching pulse width from picoseconds to femtoseconds, the nonlinear optical response of the metal will decrease significantly, which hinders the realization of the sufficient modulation depth at femtosecond optical control. Here, by combining two optical nonlinear enhancement effects of surface plasmon polaritons, including their extreme sensitivity to refractive index change and their capability to induce strong localized optical fields, we have achieved an ∼50-times enhancement in the modulation depth simultaneously with a switching time of ∼75-fs. Such enhancement was found to be independent of the control intensity, which sets a basis for the future application of femtosecond switching at a minimum power.",
author = "Kuidong Wang and Long Chen and Haijuan Zhang and Hsiao, {Hui Hsin} and Tsai, {Din Ping} and Jie Chen",
year = "2017",
month = "10",
day = "30",
doi = "10.1063/1.5002581",
language = "English",
volume = "111",
journal = "Applied Physics Letters",
issn = "0003-6951",
publisher = "American Institute of Physics Publising LLC",
number = "18",

}

TY - JOUR

T1 - Plasmon-enhanced optical nonlinearity for femtosecond all-optical switching

AU - Wang, Kuidong

AU - Chen, Long

AU - Zhang, Haijuan

AU - Hsiao, Hui Hsin

AU - Tsai, Din Ping

AU - Chen, Jie

PY - 2017/10/30

Y1 - 2017/10/30

N2 - Ultrafast all-optical switching in metals can be an efficient way for high-speed active photonic devices. However, with the improvement in modulation speed, typically by reducing the optical switching pulse width from picoseconds to femtoseconds, the nonlinear optical response of the metal will decrease significantly, which hinders the realization of the sufficient modulation depth at femtosecond optical control. Here, by combining two optical nonlinear enhancement effects of surface plasmon polaritons, including their extreme sensitivity to refractive index change and their capability to induce strong localized optical fields, we have achieved an ∼50-times enhancement in the modulation depth simultaneously with a switching time of ∼75-fs. Such enhancement was found to be independent of the control intensity, which sets a basis for the future application of femtosecond switching at a minimum power.

AB - Ultrafast all-optical switching in metals can be an efficient way for high-speed active photonic devices. However, with the improvement in modulation speed, typically by reducing the optical switching pulse width from picoseconds to femtoseconds, the nonlinear optical response of the metal will decrease significantly, which hinders the realization of the sufficient modulation depth at femtosecond optical control. Here, by combining two optical nonlinear enhancement effects of surface plasmon polaritons, including their extreme sensitivity to refractive index change and their capability to induce strong localized optical fields, we have achieved an ∼50-times enhancement in the modulation depth simultaneously with a switching time of ∼75-fs. Such enhancement was found to be independent of the control intensity, which sets a basis for the future application of femtosecond switching at a minimum power.

UR - http://www.scopus.com/inward/record.url?scp=85032904327&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85032904327&partnerID=8YFLogxK

U2 - 10.1063/1.5002581

DO - 10.1063/1.5002581

M3 - Article

VL - 111

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 18

M1 - 181102

ER -