Phase transformation of tungsten films deposited by diode and inductively coupled plasma magnetron sputtering

Engineering & Materials Science

• Inductively coupled plasma 100%
• Magnetron sputtering 89%
• Tungsten 72%
• Phase transitions 69%
• Diodes 61%
• Sputtering 57%
• Electron transitions 42%
• Electron microscopy 28%
• Diffraction 24%
• Thin films 21%
• X rays 20%
• Scanning electron microscopy 17%
• Substrates 15%

Physics & Astronomy

• phase transformations 59%
• tungsten 56%
• magnetron sputtering 56%
• diodes 50%
• sputtering 34%
• electrical resistivity 28%
• electron transitions 27%
• grazing incidence 23%
• x ray diffraction 19%
• electron microscopy 19%
• scanning electron microscopy 14%
• thin films 11%

Chemical Compounds

• Magnetron Sputtering 77%
• Inductively Coupled Plasma 66%
• Tungsten 61%
• Sputtering 48%
• Liquid Film 32%
• Electron Microscopy 19%
• Scanning Electron Microscopy 13%