Monitoring of arsenic exposure with speciated urinary inorganic arsenic metabolites for ion implanter maintenance engineers

Yaw Huei Hwang, Zhih Young Lee, Jung Der Wang, Yu Mei Hsueh, I. Chun Lu, Wan Lin Yao

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22 Citations (Scopus)


For wafer fabrication in the semiconductor industry, maintenance engineers are potentially exposed to hazards during their work of disassembling machine components for cleanup. One special concern is the presence of arsenic or arsenic compounds in the working environment. This study analyzed speciated urinary inorganic arsenic metabolites of the maintenance engineers using high-performance liquid chromatography-hydride generation atomic absorption spectrometry to study the potential arsenic exposure during their maintenance work. In total, from six wafer fabrication facilities, 30 maintenance engineers were recruited as the exposed group and another 12 office-based engineers served as the control group. First morning-voided urine samples of each study subject were collected for 7 consecutive days. The levels of total urinary inorganic arsenic metabolites for the exposed group were 1.7±1.4, 1.4±1.1, 6.2±6.7, 20.2±14.1, and 29.5±17.2μg/L for As3+, As5+, monomethylarsonic acid, dimethylarsinic acid, and total inorganic arsenic, respectively. Both the concentration of monomethylarsonic acid and its percentage in total urinary inorganic arsenic metabolites showed significantly ascending trends for the control group, for the engineers without preventative maintenance work prior to their urine sampling, and for the engineers with such work prior to their urine sampling (P

Original languageEnglish
Pages (from-to)207-216
Number of pages10
JournalEnvironmental Research
Issue number3
Publication statusPublished - Nov 2002



  • Arsenic
  • Ion implanter
  • Metabolite speciation
  • Preventative maintenance
  • Urine

ASJC Scopus subject areas

  • Environmental Science(all)

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