Abstract
TiN and CrN single layer thin films along with TiN/CrN multilayer thin film, which has an average layer thickness of 4 nm were deposited on WC substrates by a commercially used unbalanced DC magnetron sputtering. The microstructure and mechanical properties of the as-deposited films were investigated. The TiN/CrN multilayer thin film has a single phase structure with the preferential orientation of (2 0 0), a finer surface morphology and a finer columnar crystal structure. Additionally, the TiN/CrN multilayer thin film also shows better adhesion on substrate and hardness than the single layer thin films. The hardness of the annealed multilayer thin film is slightly increased after annealed at temperatures of 600-800 °C. This is attributed to the increased intensity of (1 1 1) reflection during annealing.
| Original language | English |
|---|---|
| Pages (from-to) | 3197-3201 |
| Number of pages | 5 |
| Journal | Journal of Alloys and Compounds |
| Volume | 509 |
| Issue number | 6 |
| DOIs | |
| Publication status | Published - Feb 10 2011 |
| Externally published | Yes |
Fingerprint
Keywords
- CrN
- Nanoindentation
- Thermal stability
- TiN
- Unbalanced magnetron sputtering
ASJC Scopus subject areas
- Mechanical Engineering
- Mechanics of Materials
- Materials Chemistry
- Metals and Alloys
Cite this
Mechanical behavior of TiN/CrN nano-multilayer thin film deposited by unbalanced magnetron sputter process. / Sun, Pei Ling; Su, Cherng Yuh; Liou, Tai Pin; Hsu, Cheng Hsun; Lin, Chung Kwei.
In: Journal of Alloys and Compounds, Vol. 509, No. 6, 10.02.2011, p. 3197-3201.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Mechanical behavior of TiN/CrN nano-multilayer thin film deposited by unbalanced magnetron sputter process
AU - Sun, Pei Ling
AU - Su, Cherng Yuh
AU - Liou, Tai Pin
AU - Hsu, Cheng Hsun
AU - Lin, Chung Kwei
PY - 2011/2/10
Y1 - 2011/2/10
N2 - TiN and CrN single layer thin films along with TiN/CrN multilayer thin film, which has an average layer thickness of 4 nm were deposited on WC substrates by a commercially used unbalanced DC magnetron sputtering. The microstructure and mechanical properties of the as-deposited films were investigated. The TiN/CrN multilayer thin film has a single phase structure with the preferential orientation of (2 0 0), a finer surface morphology and a finer columnar crystal structure. Additionally, the TiN/CrN multilayer thin film also shows better adhesion on substrate and hardness than the single layer thin films. The hardness of the annealed multilayer thin film is slightly increased after annealed at temperatures of 600-800 °C. This is attributed to the increased intensity of (1 1 1) reflection during annealing.
AB - TiN and CrN single layer thin films along with TiN/CrN multilayer thin film, which has an average layer thickness of 4 nm were deposited on WC substrates by a commercially used unbalanced DC magnetron sputtering. The microstructure and mechanical properties of the as-deposited films were investigated. The TiN/CrN multilayer thin film has a single phase structure with the preferential orientation of (2 0 0), a finer surface morphology and a finer columnar crystal structure. Additionally, the TiN/CrN multilayer thin film also shows better adhesion on substrate and hardness than the single layer thin films. The hardness of the annealed multilayer thin film is slightly increased after annealed at temperatures of 600-800 °C. This is attributed to the increased intensity of (1 1 1) reflection during annealing.
KW - CrN
KW - Nanoindentation
KW - Thermal stability
KW - TiN
KW - Unbalanced magnetron sputtering
UR - http://www.scopus.com/inward/record.url?scp=78651348499&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=78651348499&partnerID=8YFLogxK
U2 - 10.1016/j.jallcom.2010.12.057
DO - 10.1016/j.jallcom.2010.12.057
M3 - Article
AN - SCOPUS:78651348499
VL - 509
SP - 3197
EP - 3201
JO - Journal of Alloys and Compounds
JF - Journal of Alloys and Compounds
SN - 0925-8388
IS - 6
ER -