Mechanical behavior of TiN/CrN nano-multilayer thin film deposited by unbalanced magnetron sputter process

Pei Ling Sun, Cherng Yuh Su, Tai Pin Liou, Cheng Hsun Hsu, Chung Kwei Lin

Research output: Contribution to journalArticlepeer-review

25 Citations (Scopus)

Abstract

TiN and CrN single layer thin films along with TiN/CrN multilayer thin film, which has an average layer thickness of 4 nm were deposited on WC substrates by a commercially used unbalanced DC magnetron sputtering. The microstructure and mechanical properties of the as-deposited films were investigated. The TiN/CrN multilayer thin film has a single phase structure with the preferential orientation of (2 0 0), a finer surface morphology and a finer columnar crystal structure. Additionally, the TiN/CrN multilayer thin film also shows better adhesion on substrate and hardness than the single layer thin films. The hardness of the annealed multilayer thin film is slightly increased after annealed at temperatures of 600-800 °C. This is attributed to the increased intensity of (1 1 1) reflection during annealing.

Original languageEnglish
Pages (from-to)3197-3201
Number of pages5
JournalJournal of Alloys and Compounds
Volume509
Issue number6
DOIs
Publication statusPublished - Feb 10 2011
Externally publishedYes

Keywords

  • CrN
  • Nanoindentation
  • Thermal stability
  • TiN
  • Unbalanced magnetron sputtering

ASJC Scopus subject areas

  • Mechanical Engineering
  • Mechanics of Materials
  • Materials Chemistry
  • Metals and Alloys

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