Mechanical behavior of TiN/CrN nano-multilayer thin film deposited by unbalanced magnetron sputter process

Pei Ling Sun; Cherng Yuh Su; Tai Pin Liou; Cheng Hsun Hsu; Chung Kwei Lin

doi:10.1016/j.jallcom.2010.12.057

Mechanical behavior of TiN/CrN nano-multilayer thin film deposited by unbalanced magnetron sputter process

Pei Ling Sun, Cherng Yuh Su, Tai Pin Liou, Cheng Hsun Hsu, Chung Kwei Lin

Research output: Contribution to journal › Article › peer-review

25 Citations (Scopus)

Abstract

TiN and CrN single layer thin films along with TiN/CrN multilayer thin film, which has an average layer thickness of 4 nm were deposited on WC substrates by a commercially used unbalanced DC magnetron sputtering. The microstructure and mechanical properties of the as-deposited films were investigated. The TiN/CrN multilayer thin film has a single phase structure with the preferential orientation of (2 0 0), a finer surface morphology and a finer columnar crystal structure. Additionally, the TiN/CrN multilayer thin film also shows better adhesion on substrate and hardness than the single layer thin films. The hardness of the annealed multilayer thin film is slightly increased after annealed at temperatures of 600-800 °C. This is attributed to the increased intensity of (1 1 1) reflection during annealing.

Original language	English
Pages (from-to)	3197-3201
Number of pages	5
Journal	Journal of Alloys and Compounds
Volume	509
Issue number	6
DOIs	https://doi.org/10.1016/j.jallcom.2010.12.057
Publication status	Published - Feb 10 2011
Externally published	Yes

Keywords

CrN
Nanoindentation
Thermal stability
TiN
Unbalanced magnetron sputtering

ASJC Scopus subject areas

Mechanical Engineering
Mechanics of Materials
Materials Chemistry
Metals and Alloys

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10.1016/j.jallcom.2010.12.057

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title = "Mechanical behavior of TiN/CrN nano-multilayer thin film deposited by unbalanced magnetron sputter process",

abstract = "TiN and CrN single layer thin films along with TiN/CrN multilayer thin film, which has an average layer thickness of 4 nm were deposited on WC substrates by a commercially used unbalanced DC magnetron sputtering. The microstructure and mechanical properties of the as-deposited films were investigated. The TiN/CrN multilayer thin film has a single phase structure with the preferential orientation of (2 0 0), a finer surface morphology and a finer columnar crystal structure. Additionally, the TiN/CrN multilayer thin film also shows better adhesion on substrate and hardness than the single layer thin films. The hardness of the annealed multilayer thin film is slightly increased after annealed at temperatures of 600-800 °C. This is attributed to the increased intensity of (1 1 1) reflection during annealing.",

keywords = "CrN, Nanoindentation, Thermal stability, TiN, Unbalanced magnetron sputtering",

author = "Sun, {Pei Ling} and Su, {Cherng Yuh} and Liou, {Tai Pin} and Hsu, {Cheng Hsun} and Lin, {Chung Kwei}",

year = "2011",

month = feb,

day = "10",

doi = "10.1016/j.jallcom.2010.12.057",

language = "English",

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TY - JOUR

T1 - Mechanical behavior of TiN/CrN nano-multilayer thin film deposited by unbalanced magnetron sputter process

AU - Sun, Pei Ling

AU - Su, Cherng Yuh

AU - Liou, Tai Pin

AU - Hsu, Cheng Hsun

AU - Lin, Chung Kwei

PY - 2011/2/10

Y1 - 2011/2/10

N2 - TiN and CrN single layer thin films along with TiN/CrN multilayer thin film, which has an average layer thickness of 4 nm were deposited on WC substrates by a commercially used unbalanced DC magnetron sputtering. The microstructure and mechanical properties of the as-deposited films were investigated. The TiN/CrN multilayer thin film has a single phase structure with the preferential orientation of (2 0 0), a finer surface morphology and a finer columnar crystal structure. Additionally, the TiN/CrN multilayer thin film also shows better adhesion on substrate and hardness than the single layer thin films. The hardness of the annealed multilayer thin film is slightly increased after annealed at temperatures of 600-800 °C. This is attributed to the increased intensity of (1 1 1) reflection during annealing.

AB - TiN and CrN single layer thin films along with TiN/CrN multilayer thin film, which has an average layer thickness of 4 nm were deposited on WC substrates by a commercially used unbalanced DC magnetron sputtering. The microstructure and mechanical properties of the as-deposited films were investigated. The TiN/CrN multilayer thin film has a single phase structure with the preferential orientation of (2 0 0), a finer surface morphology and a finer columnar crystal structure. Additionally, the TiN/CrN multilayer thin film also shows better adhesion on substrate and hardness than the single layer thin films. The hardness of the annealed multilayer thin film is slightly increased after annealed at temperatures of 600-800 °C. This is attributed to the increased intensity of (1 1 1) reflection during annealing.

KW - CrN

KW - Nanoindentation

KW - Thermal stability

KW - TiN

KW - Unbalanced magnetron sputtering

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Mechanical behavior of TiN/CrN nano-multilayer thin film deposited by unbalanced magnetron sputter process

Abstract

Keywords

ASJC Scopus subject areas

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