Lichen Planus Pigmentosus Inversus Caused by Occupational Systemic Sensitization to Metals in a Semiconductor Factory Worker

Che Yuan Hsu, Donald Liu, Woan Ruoh Lee, Yi Hsien Shih

Research output: Contribution to journalComment/debate

2 Citations (Scopus)
Original languageEnglish
Pages (from-to)324-326
Number of pages3
JournalDermatitis
Volume28
Issue number5
DOIs
Publication statusPublished - Sep 1 2017

Fingerprint

Lichen Planus
Semiconductors
Metals

ASJC Scopus subject areas

  • Immunology and Allergy
  • Dermatology

Cite this

Lichen Planus Pigmentosus Inversus Caused by Occupational Systemic Sensitization to Metals in a Semiconductor Factory Worker. / Hsu, Che Yuan; Liu, Donald; Lee, Woan Ruoh; Shih, Yi Hsien.

In: Dermatitis, Vol. 28, No. 5, 01.09.2017, p. 324-326.

Research output: Contribution to journalComment/debate

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