Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)

Li Chun Wang, Yin Yi Han, Kai Chiang Yang, Miin Jang Chen, Hsin Chih Lin, Chung Kwei Lin, Yu Tong Hsu

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13 Citations (Scopus)


Thermal ALD (T-ALD) and plasma-enhanced ALD (PE-ALD) processes were employed to prepare the Al2O3 thin films on plasticized polyvinyl chloride (PVC) surfaces at a low deposition temperature of 80 °C. The water contact angle test shows that the T-ALD Al2O3 films exhibited a hydrophobic surface, while the PE-ALD Al2O3 films were hydrophilic. The difference in the surface hydrophobicity is attributed to the carbon residue in Al2O3 films, as revealed by the X-ray photoelectron and Fourier transform infrared spectroscopies. The trend of hydrophobicity follows with the evolution of surface roughness of the T-Al2O3 films, indicating that the surface roughness contributed to the hydrophobicity as predicted by the Wenzel's mode. The result indicates that the surface hydrophilicity/hydrophobicity of the Al2O3 thin films can be modified and controlled by the deposition conditions of the ALD process.

Original languageEnglish
Pages (from-to)158-164
Number of pages7
JournalSurface and Coatings Technology
Publication statusPublished - Nov 15 2016



  • Alumina
  • Atomic layer deposition
  • Hydrophilicity
  • Hydrophobicity
  • Polyvinyl chloride
  • Surface modification

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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