Erratum: Microstructure of silicon-incorporated carbon films with various silicon concentrations deposited by hybrid magnetron sputtering/chemical vapor deposition (Ceramics International (2013) 39 (5585-5590))

Hsin Chung Cheng, Da Yen Wang, Wen Chien Lan, Pei Yi Wang, Shih Fu Ou, Ya Juh Su, Keng Liang Ou

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