Erratum

Microstructure of silicon-incorporated carbon films with various silicon concentrations deposited by hybrid magnetron sputtering/chemical vapor deposition (Ceramics International (2013) 39 (5585-5590))

Hsin Chung Cheng, Da Yen Wang, Wen Chien Lan, Pei Yi Wang, Shih Fu Ou, Ya Juh Su, Keng Liang Ou

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)8935
Number of pages1
JournalCeramics International
Volume40
Issue number6
DOIs
Publication statusPublished - 2014

Fingerprint

Carbon films
Magnetron sputtering
Chemical vapor deposition
Silicon
Microstructure

ASJC Scopus subject areas

  • Ceramics and Composites
  • Process Chemistry and Technology
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

Erratum : Microstructure of silicon-incorporated carbon films with various silicon concentrations deposited by hybrid magnetron sputtering/chemical vapor deposition (Ceramics International (2013) 39 (5585-5590)). / Cheng, Hsin Chung; Wang, Da Yen; Lan, Wen Chien; Wang, Pei Yi; Ou, Shih Fu; Su, Ya Juh; Ou, Keng Liang.

In: Ceramics International, Vol. 40, No. 6, 2014, p. 8935.

Research output: Contribution to journalArticle

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author = "Cheng, {Hsin Chung} and Wang, {Da Yen} and Lan, {Wen Chien} and Wang, {Pei Yi} and Ou, {Shih Fu} and Su, {Ya Juh} and Ou, {Keng Liang}",
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AU - Lan, Wen Chien

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AU - Ou, Shih Fu

AU - Su, Ya Juh

AU - Ou, Keng Liang

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