DNA mismatch detection by metal ion enhanced impedance analysis

Peng Chung Jangjian, Tzeng Feng Liu, Chuan Mei Tsai, Mei Yi Li, Ming Shih Tsai, Shin Hua Tseng, Tsai Mu Cheng, Chia Ching Chang

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

Conventional diagnoses of genetic mutation and disease depend on the analysis of DNA sequences. However, mismatches in the DNA sequences are difficult to detect using tradi- tional sequencing. Doping metal ions, such as nickel, into the short DNA (28 mer ~ 30 mer), markedly reduces its electrical resistance, which is measured by electrical impedance analysis. The change in resistance that is caused by a mismatched base-pair in short DNA can also be monitored by this approach. In this study, the resistance increased exponentially with the number of mismatched base-pairs. Accordingly, an intuitive and direct method for evaluating the number of DNA mismatches can possibly be developed.

Original languageEnglish
Pages (from-to)740-747
Number of pages8
JournalChinese Journal of Physics
Volume47
Issue number5
Publication statusPublished - Oct 2009
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Fingerprint Dive into the research topics of 'DNA mismatch detection by metal ion enhanced impedance analysis'. Together they form a unique fingerprint.

  • Cite this

    Jangjian, P. C., Liu, T. F., Tsai, C. M., Li, M. Y., Tsai, M. S., Tseng, S. H., Cheng, T. M., & Chang, C. C. (2009). DNA mismatch detection by metal ion enhanced impedance analysis. Chinese Journal of Physics, 47(5), 740-747.