DNA mismatch detection by metal ion enhanced impedance analysis

Peng Chung Jangjian, Tzeng Feng Liu, Chuan Mei Tsai, Mei Yi Li, Ming Shih Tsai, Shin Hua Tseng, Tsai Mu Cheng, Chia Ching Chang

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

Conventional diagnoses of genetic mutation and disease depend on the analysis of DNA sequences. However, mismatches in the DNA sequences are difficult to detect using tradi- tional sequencing. Doping metal ions, such as nickel, into the short DNA (28 mer ~ 30 mer), markedly reduces its electrical resistance, which is measured by electrical impedance analysis. The change in resistance that is caused by a mismatched base-pair in short DNA can also be monitored by this approach. In this study, the resistance increased exponentially with the number of mismatched base-pairs. Accordingly, an intuitive and direct method for evaluating the number of DNA mismatches can possibly be developed.

Original languageEnglish
Pages (from-to)740-747
Number of pages8
JournalChinese Journal of Physics
Volume47
Issue number5
Publication statusPublished - Oct 2009
Externally publishedYes

Fingerprint

metal ions
deoxyribonucleic acid
impedance
sequencing
mutations
electrical impedance
electrical resistance
nickel

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Jangjian, P. C., Liu, T. F., Tsai, C. M., Li, M. Y., Tsai, M. S., Tseng, S. H., ... Chang, C. C. (2009). DNA mismatch detection by metal ion enhanced impedance analysis. Chinese Journal of Physics, 47(5), 740-747.

DNA mismatch detection by metal ion enhanced impedance analysis. / Jangjian, Peng Chung; Liu, Tzeng Feng; Tsai, Chuan Mei; Li, Mei Yi; Tsai, Ming Shih; Tseng, Shin Hua; Cheng, Tsai Mu; Chang, Chia Ching.

In: Chinese Journal of Physics, Vol. 47, No. 5, 10.2009, p. 740-747.

Research output: Contribution to journalArticle

Jangjian, PC, Liu, TF, Tsai, CM, Li, MY, Tsai, MS, Tseng, SH, Cheng, TM & Chang, CC 2009, 'DNA mismatch detection by metal ion enhanced impedance analysis', Chinese Journal of Physics, vol. 47, no. 5, pp. 740-747.
Jangjian PC, Liu TF, Tsai CM, Li MY, Tsai MS, Tseng SH et al. DNA mismatch detection by metal ion enhanced impedance analysis. Chinese Journal of Physics. 2009 Oct;47(5):740-747.
Jangjian, Peng Chung ; Liu, Tzeng Feng ; Tsai, Chuan Mei ; Li, Mei Yi ; Tsai, Ming Shih ; Tseng, Shin Hua ; Cheng, Tsai Mu ; Chang, Chia Ching. / DNA mismatch detection by metal ion enhanced impedance analysis. In: Chinese Journal of Physics. 2009 ; Vol. 47, No. 5. pp. 740-747.
@article{134c4937e4994d38bf0b55ceca5b354f,
title = "DNA mismatch detection by metal ion enhanced impedance analysis",
abstract = "Conventional diagnoses of genetic mutation and disease depend on the analysis of DNA sequences. However, mismatches in the DNA sequences are difficult to detect using tradi- tional sequencing. Doping metal ions, such as nickel, into the short DNA (28 mer ~ 30 mer), markedly reduces its electrical resistance, which is measured by electrical impedance analysis. The change in resistance that is caused by a mismatched base-pair in short DNA can also be monitored by this approach. In this study, the resistance increased exponentially with the number of mismatched base-pairs. Accordingly, an intuitive and direct method for evaluating the number of DNA mismatches can possibly be developed.",
author = "Jangjian, {Peng Chung} and Liu, {Tzeng Feng} and Tsai, {Chuan Mei} and Li, {Mei Yi} and Tsai, {Ming Shih} and Tseng, {Shin Hua} and Cheng, {Tsai Mu} and Chang, {Chia Ching}",
year = "2009",
month = "10",
language = "English",
volume = "47",
pages = "740--747",
journal = "Chinese Journal of Physics",
issn = "0577-9073",
publisher = "Physical Society of the Republic of China",
number = "5",

}

TY - JOUR

T1 - DNA mismatch detection by metal ion enhanced impedance analysis

AU - Jangjian, Peng Chung

AU - Liu, Tzeng Feng

AU - Tsai, Chuan Mei

AU - Li, Mei Yi

AU - Tsai, Ming Shih

AU - Tseng, Shin Hua

AU - Cheng, Tsai Mu

AU - Chang, Chia Ching

PY - 2009/10

Y1 - 2009/10

N2 - Conventional diagnoses of genetic mutation and disease depend on the analysis of DNA sequences. However, mismatches in the DNA sequences are difficult to detect using tradi- tional sequencing. Doping metal ions, such as nickel, into the short DNA (28 mer ~ 30 mer), markedly reduces its electrical resistance, which is measured by electrical impedance analysis. The change in resistance that is caused by a mismatched base-pair in short DNA can also be monitored by this approach. In this study, the resistance increased exponentially with the number of mismatched base-pairs. Accordingly, an intuitive and direct method for evaluating the number of DNA mismatches can possibly be developed.

AB - Conventional diagnoses of genetic mutation and disease depend on the analysis of DNA sequences. However, mismatches in the DNA sequences are difficult to detect using tradi- tional sequencing. Doping metal ions, such as nickel, into the short DNA (28 mer ~ 30 mer), markedly reduces its electrical resistance, which is measured by electrical impedance analysis. The change in resistance that is caused by a mismatched base-pair in short DNA can also be monitored by this approach. In this study, the resistance increased exponentially with the number of mismatched base-pairs. Accordingly, an intuitive and direct method for evaluating the number of DNA mismatches can possibly be developed.

UR - http://www.scopus.com/inward/record.url?scp=77349091342&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77349091342&partnerID=8YFLogxK

M3 - Article

VL - 47

SP - 740

EP - 747

JO - Chinese Journal of Physics

JF - Chinese Journal of Physics

SN - 0577-9073

IS - 5

ER -