Correction: Formation and characterization of the high precision nanoscale thin film resistors on radio frequency application [Int. J. Electrochem. Sci., 10 (2015) (6517-6526)]

Huei Yu Huang, Chia-Yu Wu, Chi Chang Wu

Research output: Contribution to journalComment/debate

Abstract

This was not noticed at the time by the authors and it is corrected by this correction now, and we apologize for any inconvenience this may cause.

Original languageEnglish
Pages (from-to)6155
Number of pages1
JournalInternational Journal of Electrochemical Science
Volume13
Issue number6
DOIs
Publication statusPublished - Jun 1 2018

Fingerprint

Resistors
Thin films

ASJC Scopus subject areas

  • Electrochemistry

Cite this

@article{bb443efc54dc45fb9b22da2a97a89c1f,
title = "Correction: Formation and characterization of the high precision nanoscale thin film resistors on radio frequency application [Int. J. Electrochem. Sci., 10 (2015) (6517-6526)]",
abstract = "This was not noticed at the time by the authors and it is corrected by this correction now, and we apologize for any inconvenience this may cause.",
author = "Huang, {Huei Yu} and Chia-Yu Wu and Wu, {Chi Chang}",
year = "2018",
month = "6",
day = "1",
doi = "10.20964/2018.06.200",
language = "English",
volume = "13",
pages = "6155",
journal = "International Journal of Electrochemical Science",
issn = "1452-3981",
publisher = "Electrochemical Science Group",
number = "6",

}

TY - JOUR

T1 - Correction

T2 - Formation and characterization of the high precision nanoscale thin film resistors on radio frequency application [Int. J. Electrochem. Sci., 10 (2015) (6517-6526)]

AU - Huang, Huei Yu

AU - Wu, Chia-Yu

AU - Wu, Chi Chang

PY - 2018/6/1

Y1 - 2018/6/1

N2 - This was not noticed at the time by the authors and it is corrected by this correction now, and we apologize for any inconvenience this may cause.

AB - This was not noticed at the time by the authors and it is corrected by this correction now, and we apologize for any inconvenience this may cause.

UR - http://www.scopus.com/inward/record.url?scp=85048298352&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85048298352&partnerID=8YFLogxK

U2 - 10.20964/2018.06.200

DO - 10.20964/2018.06.200

M3 - Comment/debate

AN - SCOPUS:85048298352

VL - 13

SP - 6155

JO - International Journal of Electrochemical Science

JF - International Journal of Electrochemical Science

SN - 1452-3981

IS - 6

ER -