Automatic recognition of basal cisterns on brain CT

Ke Chun Huang, Furen Xiao, Jau Min Wong, I-Jen Chiang, Chun Chih Liao

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Effacement of the basal cisterns (BC) and midline shift (MLS) are two most important features clinicians use to evaluate the severity of brain compression by various pathologies. Because of its complex shape, measuring the compression of the BC is not an easy task and its standardization has not been proposed until recently. Based on this standard method, we develop a method for automatic recognition of the BC on brain CT slices. Hypodense pixels of the brain area on each slice are found with a threshold derived from its own histogram. Hough transform is then applied to find the semicircular band containing largest number of hypodense pixels within the lower-central brain. This area was recognized as the normal or abnormal BC if it fits certain rules derived from human experts. Our system is tested on patient images. We found good inter-rater agreement between the results generated by our system and those evaluated by a board-certified neurosurgeon (kappa = 0.957).

Original languageEnglish
Title of host publicationAdvanced Materials Research
Pages5121-5125
Number of pages5
Volume403-408
DOIs
Publication statusPublished - 2012
Event2011 7th International Conference on MEMS, NANO and Smart Systems, ICMENS 2011 - Kuala Lumpur, Malaysia
Duration: Nov 4 2011Nov 6 2011

Publication series

NameAdvanced Materials Research
Volume403-408
ISSN (Print)10226680

Other

Other2011 7th International Conference on MEMS, NANO and Smart Systems, ICMENS 2011
CountryMalaysia
CityKuala Lumpur
Period11/4/1111/6/11

Keywords

  • Basal cistern
  • Brain deformation
  • Computed tomography
  • Mass effect

ASJC Scopus subject areas

  • Engineering(all)

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  • Cite this

    Huang, K. C., Xiao, F., Wong, J. M., Chiang, I-J., & Liao, C. C. (2012). Automatic recognition of basal cisterns on brain CT. In Advanced Materials Research (Vol. 403-408, pp. 5121-5125). (Advanced Materials Research; Vol. 403-408). https://doi.org/10.4028/www.scientific.net/AMR.403-408.5121