Application of ozone related processes to mineralize tetramethyl ammonium hydroxide in aqueous solution

Chyow San Chiou, Kai Jen Chuang, Ya Fen Lin, Hua Wei Chen, Chih Ming Ma

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

Tetramethyl ammonium hydroxide (TMAH) is an anisotropic etchant used in the wet etching process of the semiconductor industry and is hard to degrade by biotreatments when it exists in wastewater. This study evaluated the performance of a system combined with ultraviolet, magnetic catalyst (SiO 2/Fe3O4) and O3, denoted as UV/O3, to TMAH in an aqueous solution. The mineralization efficiency of TMAH under various conditions follows the sequence: UV/O3 > UV/H2O2/O3 > H2O 2/SiO2/Fe3O4/O3 > H2O2/O3 > SiO2/Fe 3O4/O3 > O3 > UV/H 2O2. The results suggest that UV/O3 process provides the best condition for the mineralization of TMAH (40 mg/L), resulting in 87.6% mineralization, at 60 min reaction time. Furthermore, the mineralization efficiency of SiO2/Fe3O4/H 2O2/O3 was significantly higher than that of O3, H2O2/O3, and UV/H 2O2. More than 90% of the magnetic catalyst was recovered and easily redispersed in a solution for reuse.

Original languageEnglish
Article number191742
JournalInternational Journal of Photoenergy
Volume2013
DOIs
Publication statusPublished - 2013

Fingerprint

Ammonium Hydroxide
Ammonium hydroxide
Ozone
ozone
hydroxides
aqueous solutions
catalysts
Catalysts
etchants
Wet etching
reuse
reaction time
Wastewater
industries
etching
Semiconductor materials
Industry

ASJC Scopus subject areas

  • Renewable Energy, Sustainability and the Environment
  • Chemistry(all)
  • Atomic and Molecular Physics, and Optics
  • Materials Science(all)

Cite this

Application of ozone related processes to mineralize tetramethyl ammonium hydroxide in aqueous solution. / Chiou, Chyow San; Chuang, Kai Jen; Lin, Ya Fen; Chen, Hua Wei; Ma, Chih Ming.

In: International Journal of Photoenergy, Vol. 2013, 191742, 2013.

Research output: Contribution to journalArticle

@article{02773639533d496e888450c46d3e2233,
title = "Application of ozone related processes to mineralize tetramethyl ammonium hydroxide in aqueous solution",
abstract = "Tetramethyl ammonium hydroxide (TMAH) is an anisotropic etchant used in the wet etching process of the semiconductor industry and is hard to degrade by biotreatments when it exists in wastewater. This study evaluated the performance of a system combined with ultraviolet, magnetic catalyst (SiO 2/Fe3O4) and O3, denoted as UV/O3, to TMAH in an aqueous solution. The mineralization efficiency of TMAH under various conditions follows the sequence: UV/O3 > UV/H2O2/O3 > H2O 2/SiO2/Fe3O4/O3 > H2O2/O3 > SiO2/Fe 3O4/O3 > O3 > UV/H 2O2. The results suggest that UV/O3 process provides the best condition for the mineralization of TMAH (40 mg/L), resulting in 87.6{\%} mineralization, at 60 min reaction time. Furthermore, the mineralization efficiency of SiO2/Fe3O4/H 2O2/O3 was significantly higher than that of O3, H2O2/O3, and UV/H 2O2. More than 90{\%} of the magnetic catalyst was recovered and easily redispersed in a solution for reuse.",
author = "Chiou, {Chyow San} and Chuang, {Kai Jen} and Lin, {Ya Fen} and Chen, {Hua Wei} and Ma, {Chih Ming}",
year = "2013",
doi = "10.1155/2013/191742",
language = "English",
volume = "2013",
journal = "International Journal of Photoenergy",
issn = "1110-662X",
publisher = "Hindawi Publishing Corporation",

}

TY - JOUR

T1 - Application of ozone related processes to mineralize tetramethyl ammonium hydroxide in aqueous solution

AU - Chiou, Chyow San

AU - Chuang, Kai Jen

AU - Lin, Ya Fen

AU - Chen, Hua Wei

AU - Ma, Chih Ming

PY - 2013

Y1 - 2013

N2 - Tetramethyl ammonium hydroxide (TMAH) is an anisotropic etchant used in the wet etching process of the semiconductor industry and is hard to degrade by biotreatments when it exists in wastewater. This study evaluated the performance of a system combined with ultraviolet, magnetic catalyst (SiO 2/Fe3O4) and O3, denoted as UV/O3, to TMAH in an aqueous solution. The mineralization efficiency of TMAH under various conditions follows the sequence: UV/O3 > UV/H2O2/O3 > H2O 2/SiO2/Fe3O4/O3 > H2O2/O3 > SiO2/Fe 3O4/O3 > O3 > UV/H 2O2. The results suggest that UV/O3 process provides the best condition for the mineralization of TMAH (40 mg/L), resulting in 87.6% mineralization, at 60 min reaction time. Furthermore, the mineralization efficiency of SiO2/Fe3O4/H 2O2/O3 was significantly higher than that of O3, H2O2/O3, and UV/H 2O2. More than 90% of the magnetic catalyst was recovered and easily redispersed in a solution for reuse.

AB - Tetramethyl ammonium hydroxide (TMAH) is an anisotropic etchant used in the wet etching process of the semiconductor industry and is hard to degrade by biotreatments when it exists in wastewater. This study evaluated the performance of a system combined with ultraviolet, magnetic catalyst (SiO 2/Fe3O4) and O3, denoted as UV/O3, to TMAH in an aqueous solution. The mineralization efficiency of TMAH under various conditions follows the sequence: UV/O3 > UV/H2O2/O3 > H2O 2/SiO2/Fe3O4/O3 > H2O2/O3 > SiO2/Fe 3O4/O3 > O3 > UV/H 2O2. The results suggest that UV/O3 process provides the best condition for the mineralization of TMAH (40 mg/L), resulting in 87.6% mineralization, at 60 min reaction time. Furthermore, the mineralization efficiency of SiO2/Fe3O4/H 2O2/O3 was significantly higher than that of O3, H2O2/O3, and UV/H 2O2. More than 90% of the magnetic catalyst was recovered and easily redispersed in a solution for reuse.

UR - http://www.scopus.com/inward/record.url?scp=84893795451&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84893795451&partnerID=8YFLogxK

U2 - 10.1155/2013/191742

DO - 10.1155/2013/191742

M3 - Article

VL - 2013

JO - International Journal of Photoenergy

JF - International Journal of Photoenergy

SN - 1110-662X

M1 - 191742

ER -