Anti-adhesive effects of diverse self-assembled monolayers in nanoimprint lithography

Chih Wei Wu, Yung Kang Shen, Sheng Yu Chuang, C. S. Wei

Research output: Contribution to journalArticle

19 Citations (Scopus)

Abstract

Nanoimprint lithography is a highly effective method for manufacturing nanostructures. Although it is an excellent replication technique, the imprinted polymer adheres to the mold into which it is inserted, causing a severe problem. Numerous elementary experiments were performed to evaluate this phenomenon. For example, self-assembled monolayers such as CH3(CH2)17SiCl3 (OTS) and CF3(CF2)7(CH2)2SiCl3 (FDTS) are adopted as an anti-adhesive layer to increase the lifetime of the mold. Processing conditions are presented and the obtained results discussed. Consequently, the height and size of the OTS layer increase with the deposition temperature. After 17 imprint cycles, the amount of polymer residue was least on the mold coated with OTS, immersed in toluene at 25 °C in 20% humidity. The same result was obtained using a mold coated with FDTS. The anti-adhesive efficacy of FDTS is almost constant even as the temperature increased to 300 °C. This anti-adhesive monolayer may be the best choice for high-temperature nanoimprinting.

Original languageEnglish
Pages (from-to)145-151
Number of pages7
JournalSensors and Actuators, A: Physical
Volume139
Issue number1-2 SPEC. ISS.
DOIs
Publication statusPublished - Sep 12 2007
Externally publishedYes

Fingerprint

Nanoimprint lithography
OTS (ESA)
Self assembled monolayers
adhesives
Adhesives
lithography
Polymers
Toluene
Temperature
Monolayers
Nanostructures
Atmospheric humidity
polymers
toluene
humidity
manufacturing
Processing
life (durability)
cycles
temperature

Keywords

  • Anti-adhesive
  • Nanoimprint
  • Self-assembled monolayer

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Mechanical Engineering
  • Instrumentation

Cite this

Anti-adhesive effects of diverse self-assembled monolayers in nanoimprint lithography. / Wu, Chih Wei; Shen, Yung Kang; Chuang, Sheng Yu; Wei, C. S.

In: Sensors and Actuators, A: Physical, Vol. 139, No. 1-2 SPEC. ISS., 12.09.2007, p. 145-151.

Research output: Contribution to journalArticle

Wu, Chih Wei ; Shen, Yung Kang ; Chuang, Sheng Yu ; Wei, C. S. / Anti-adhesive effects of diverse self-assembled monolayers in nanoimprint lithography. In: Sensors and Actuators, A: Physical. 2007 ; Vol. 139, No. 1-2 SPEC. ISS. pp. 145-151.
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