Annealing induced structural evolution and electrochromic properties of nanostructured tungsten oxide films

Ching Lin Wu, Chung Kwei Lin, Chun Kai Wang, Sheng Chang Wang, Jow Lay Huang

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

The effect of microstructure on the optical and electrochemical properties of nanostructured tungsten oxide films was evaluated as a function of annealing temperature. The films using block copolymer as the template were prepared from peroxotungstic acid (PTA) by spin-coating onto the substrate and post-annealed at 250-400 C to form tungsten oxide films with nanostructure. The microstructure of the films was measured by X-ray diffraction and surface electron microscopy. The films annealed at temperatures below 300 C are characterized by amorphous or nanocrystalline structures with a pore size of less than 10 nm. The evaluated annealing temperature caused a triclinic crystalline structure and microcracks. Cyclic voltammetry measurements were performed in a LiClO4-propylene carbonate electrolyte. The results showed that the ion inserted capacity were maximized for films annealed at 300 C and decreased with the increasing of annealing temperature. The electrochromic properties of the nanostructured tungsten oxide films were evaluated simultaneously by potentiostat and UV-vis spectroscopy. The films annealed at 300 C exhibit high transmission modulation (â̂†T ~ 40%) at λ = 633 nm and good kinetic properties. As a result, the correlation between the microstructure and kinetic properties was established, and the electrochromic properties have been demonstrated.

Original languageEnglish
Pages (from-to)258-262
Number of pages5
JournalThin Solid Films
Volume549
DOIs
Publication statusPublished - Dec 31 2013

Fingerprint

tungsten oxides
Oxide films
Tungsten
oxide films
Annealing
annealing
microstructure
Microstructure
nanostructure (characteristics)
Temperature
Kinetics
temperature
microcracks
kinetics
Spin coating
Microcracks
block copolymers
Ultraviolet spectroscopy
propylene
Electrochemical properties

Keywords

  • Electrochromism
  • Nanostructured
  • Post annealing
  • Sol-gel method
  • Tungsten oxide films

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Metals and Alloys
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

Annealing induced structural evolution and electrochromic properties of nanostructured tungsten oxide films. / Wu, Ching Lin; Lin, Chung Kwei; Wang, Chun Kai; Wang, Sheng Chang; Huang, Jow Lay.

In: Thin Solid Films, Vol. 549, 31.12.2013, p. 258-262.

Research output: Contribution to journalArticle

Wu, Ching Lin ; Lin, Chung Kwei ; Wang, Chun Kai ; Wang, Sheng Chang ; Huang, Jow Lay. / Annealing induced structural evolution and electrochromic properties of nanostructured tungsten oxide films. In: Thin Solid Films. 2013 ; Vol. 549. pp. 258-262.
@article{09bbd89743b649e2b6d349cbe02e8851,
title = "Annealing induced structural evolution and electrochromic properties of nanostructured tungsten oxide films",
abstract = "The effect of microstructure on the optical and electrochemical properties of nanostructured tungsten oxide films was evaluated as a function of annealing temperature. The films using block copolymer as the template were prepared from peroxotungstic acid (PTA) by spin-coating onto the substrate and post-annealed at 250-400 C to form tungsten oxide films with nanostructure. The microstructure of the films was measured by X-ray diffraction and surface electron microscopy. The films annealed at temperatures below 300 C are characterized by amorphous or nanocrystalline structures with a pore size of less than 10 nm. The evaluated annealing temperature caused a triclinic crystalline structure and microcracks. Cyclic voltammetry measurements were performed in a LiClO4-propylene carbonate electrolyte. The results showed that the ion inserted capacity were maximized for films annealed at 300 C and decreased with the increasing of annealing temperature. The electrochromic properties of the nanostructured tungsten oxide films were evaluated simultaneously by potentiostat and UV-vis spectroscopy. The films annealed at 300 C exhibit high transmission modulation ({\^a}̂†T ~ 40{\%}) at λ = 633 nm and good kinetic properties. As a result, the correlation between the microstructure and kinetic properties was established, and the electrochromic properties have been demonstrated.",
keywords = "Electrochromism, Nanostructured, Post annealing, Sol-gel method, Tungsten oxide films",
author = "Wu, {Ching Lin} and Lin, {Chung Kwei} and Wang, {Chun Kai} and Wang, {Sheng Chang} and Huang, {Jow Lay}",
year = "2013",
month = "12",
day = "31",
doi = "10.1016/j.tsf.2013.06.022",
language = "English",
volume = "549",
pages = "258--262",
journal = "Thin Solid Films",
issn = "0040-6090",
publisher = "Elsevier",

}

TY - JOUR

T1 - Annealing induced structural evolution and electrochromic properties of nanostructured tungsten oxide films

AU - Wu, Ching Lin

AU - Lin, Chung Kwei

AU - Wang, Chun Kai

AU - Wang, Sheng Chang

AU - Huang, Jow Lay

PY - 2013/12/31

Y1 - 2013/12/31

N2 - The effect of microstructure on the optical and electrochemical properties of nanostructured tungsten oxide films was evaluated as a function of annealing temperature. The films using block copolymer as the template were prepared from peroxotungstic acid (PTA) by spin-coating onto the substrate and post-annealed at 250-400 C to form tungsten oxide films with nanostructure. The microstructure of the films was measured by X-ray diffraction and surface electron microscopy. The films annealed at temperatures below 300 C are characterized by amorphous or nanocrystalline structures with a pore size of less than 10 nm. The evaluated annealing temperature caused a triclinic crystalline structure and microcracks. Cyclic voltammetry measurements were performed in a LiClO4-propylene carbonate electrolyte. The results showed that the ion inserted capacity were maximized for films annealed at 300 C and decreased with the increasing of annealing temperature. The electrochromic properties of the nanostructured tungsten oxide films were evaluated simultaneously by potentiostat and UV-vis spectroscopy. The films annealed at 300 C exhibit high transmission modulation (â̂†T ~ 40%) at λ = 633 nm and good kinetic properties. As a result, the correlation between the microstructure and kinetic properties was established, and the electrochromic properties have been demonstrated.

AB - The effect of microstructure on the optical and electrochemical properties of nanostructured tungsten oxide films was evaluated as a function of annealing temperature. The films using block copolymer as the template were prepared from peroxotungstic acid (PTA) by spin-coating onto the substrate and post-annealed at 250-400 C to form tungsten oxide films with nanostructure. The microstructure of the films was measured by X-ray diffraction and surface electron microscopy. The films annealed at temperatures below 300 C are characterized by amorphous or nanocrystalline structures with a pore size of less than 10 nm. The evaluated annealing temperature caused a triclinic crystalline structure and microcracks. Cyclic voltammetry measurements were performed in a LiClO4-propylene carbonate electrolyte. The results showed that the ion inserted capacity were maximized for films annealed at 300 C and decreased with the increasing of annealing temperature. The electrochromic properties of the nanostructured tungsten oxide films were evaluated simultaneously by potentiostat and UV-vis spectroscopy. The films annealed at 300 C exhibit high transmission modulation (â̂†T ~ 40%) at λ = 633 nm and good kinetic properties. As a result, the correlation between the microstructure and kinetic properties was established, and the electrochromic properties have been demonstrated.

KW - Electrochromism

KW - Nanostructured

KW - Post annealing

KW - Sol-gel method

KW - Tungsten oxide films

UR - http://www.scopus.com/inward/record.url?scp=84888642941&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84888642941&partnerID=8YFLogxK

U2 - 10.1016/j.tsf.2013.06.022

DO - 10.1016/j.tsf.2013.06.022

M3 - Article

AN - SCOPUS:84888642941

VL - 549

SP - 258

EP - 262

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

ER -