Analysis on microstructure and characteristics of TiAlN/CrN nano-multilayer films deposited by cathodic arc deposition

P. L. Sun, C. H. Hsu, S. H. Liu, C. Y. Su, C. K. Lin

Research output: Contribution to journalArticle

24 Citations (Scopus)

Abstract

In this study, TiAlN/CrN multilayer thin films were deposited on SUS 403 stainless steel by cathodic arc deposition. The effects of substrate orientation (substrate surface parallel/perpendicular to target surface) and rotation speed were investigated in detail. Microstructure of the coatings was analyzed by X-ray diffraction, X-ray photoelectron spectroscopy and scanning electron microscopy. Meanwhile, tribological and corrosion tests were performed. The experimental results showed that the as-deposited films exhibit a nano-scale multilayer structure consisting of TiAlN and CrN phases. The TiAlN/CrN multilayer films prepared by a parallel orientation and a rotation speed of 4 rpm not only possesses the best coating hardness and hardness/elastic modulus ratio, but also reveals superior abrasion resistance and corrosion resistance.

Original languageEnglish
Pages (from-to)7519-7522
Number of pages4
JournalThin Solid Films
Volume518
Issue number24
DOIs
Publication statusPublished - Oct 1 2010
Externally publishedYes

Fingerprint

Multilayer films
hardness
arcs
Hardness
abrasion resistance
coatings
Coatings
corrosion tests
microstructure
Microstructure
Stainless Steel
Substrates
corrosion resistance
laminates
Wear resistance
Corrosion resistance
stainless steels
modulus of elasticity
Multilayers
x rays

Keywords

  • Abrasion
  • Cathodic arc deposition
  • Corrosion resistance
  • CrN
  • TiAlN

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Metals and Alloys
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

Analysis on microstructure and characteristics of TiAlN/CrN nano-multilayer films deposited by cathodic arc deposition. / Sun, P. L.; Hsu, C. H.; Liu, S. H.; Su, C. Y.; Lin, C. K.

In: Thin Solid Films, Vol. 518, No. 24, 01.10.2010, p. 7519-7522.

Research output: Contribution to journalArticle

Sun, P. L. ; Hsu, C. H. ; Liu, S. H. ; Su, C. Y. ; Lin, C. K. / Analysis on microstructure and characteristics of TiAlN/CrN nano-multilayer films deposited by cathodic arc deposition. In: Thin Solid Films. 2010 ; Vol. 518, No. 24. pp. 7519-7522.
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AU - Lin, C. K.

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