Analysis on microstructure and characteristics of TiAlN/CrN nano-multilayer films deposited by cathodic arc deposition

P. L. Sun, C. H. Hsu, S. H. Liu, C. Y. Su, C. K. Lin

Research output: Contribution to journalArticle

24 Citations (Scopus)

Abstract

In this study, TiAlN/CrN multilayer thin films were deposited on SUS 403 stainless steel by cathodic arc deposition. The effects of substrate orientation (substrate surface parallel/perpendicular to target surface) and rotation speed were investigated in detail. Microstructure of the coatings was analyzed by X-ray diffraction, X-ray photoelectron spectroscopy and scanning electron microscopy. Meanwhile, tribological and corrosion tests were performed. The experimental results showed that the as-deposited films exhibit a nano-scale multilayer structure consisting of TiAlN and CrN phases. The TiAlN/CrN multilayer films prepared by a parallel orientation and a rotation speed of 4 rpm not only possesses the best coating hardness and hardness/elastic modulus ratio, but also reveals superior abrasion resistance and corrosion resistance.

Original languageEnglish
Pages (from-to)7519-7522
Number of pages4
JournalThin Solid Films
Volume518
Issue number24
DOIs
Publication statusPublished - Oct 1 2010
Externally publishedYes

Keywords

  • Abrasion
  • Cathodic arc deposition
  • Corrosion resistance
  • CrN
  • TiAlN

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Metals and Alloys
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

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