An ultra-fast response gasochromic device for hydrogen gas detection

Chia Hao Hsu, Chung Chieh Chang, Chuan Ming Tseng, Chih Chieh Chan, Wei Hsiang Chao, Yu Ruei Wu, Min Hsueh Wen, Yao Tsung Hsieh, Yi Chih Wang, Chi Liang Chen, Ming Jye Wang, Maw Kuen Wu

Research output: Contribution to journalArticlepeer-review

31 Citations (Scopus)


In the present work, gasochromic tungsten oxide (WO3) thin films on glass substrate were fabricated by Pulsed Laser Deposition (PLD) system. Pt was sputtered on the surface of WO3 thin films as a catalyst layer for hydrogen gas detection. The gasochromic properties of Pt/WO3 thin films at room temperature were determined by examining their optical transmittance under various H2-N2 mixture gas exposures. The results show that in low H2 atmosphere (0.5%) the room temperature grown Pt/WO3 thin films still exhibited noticeable transmittance change, within the visible light (550-700 nm) range. WO 3 thin films have been characterized by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), transmission electron microscopy (TEM) and scanning electron microscopy (SEM). XRD and TEM confirmed that the morphology of the best performance WO3 thin film is amorphous, and SEM investigations revealed that the thin films were composed of nanotextured grains.

Original languageEnglish
Pages (from-to)193-198
Number of pages6
JournalSensors and Actuators, B: Chemical
Publication statusPublished - 2013
Externally publishedYes


  • Gasochromic
  • Pulsed laser deposition
  • Tungsten oxide

ASJC Scopus subject areas

  • Instrumentation
  • Materials Chemistry
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering


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